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Zuoming Te Zhao

from San Jose, CA
Age ~47

Zuoming Zhao Phones & Addresses

  • San Jose, CA
  • Chandler, AZ
  • Los Angeles, CA
  • Hattiesburg, MS
  • Alhambra, CA
  • El Monte, CA

Work

Company: Intel corporation Position: Engineer

Industries

Semiconductors

Resumes

Resumes

Zuoming Zhao Photo 1

Zuoming Zhao

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Location:
Chandler, AZ
Industry:
Semiconductors
Work:
Intel Corporation
Engineer

Publications

Us Patents

Method To Inhibit Metal-To-Metal Stiction Issues In Mems Fabrication

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US Patent:
20140001583, Jan 2, 2014
Filed:
Jun 30, 2012
Appl. No.:
13/539444
Inventors:
Weng Hong Teh - Phoenix AZ, US
Zuoming Ming Zhao - Chandler AZ, US
Danny R. Singh - Chandler AZ, US
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
H01L 29/84
H01L 21/50
US Classification:
257417, 438 50, 257E21499, 257E29324
Abstract:
An apparatus including a die including a first side and an opposite second side including a device side with contact points and lateral sidewalls defining a thickness of the die; a build-up carrier coupled to the second side of the die, the build-up carrier including a plurality of alternating layers of conductive material and insulating material, wherein at least one of the layers of conductive material is coupled to one of the contact points of the die; and at least one device within the build-up carrier disposed in an area void of a layer of patterned conductive material. A method and an apparatus including a computing device including a package including a microprocessor are also disclosed.

Phase Change Memory Device And Method Of Making Same

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US Patent:
20070052009, Mar 8, 2007
Filed:
Sep 5, 2006
Appl. No.:
11/470216
Inventors:
Ya-Hong Xie - Beverly Hills CA, US
Tae-Sik Yoon - Seoul, KR
Zuoming Zhao - Alhambra CA, US
Assignee:
The Regents of the University of California - Oakland CA
International Classification:
H01L 29/788
US Classification:
257318000
Abstract:
A phase change random access memory (PRAM) element is provided that is driven by a MOSFET. The MOSFET includes, for example, a source region, a drain region, and a gate electrode disposed between the source region and the drain region. An insulator layer (e.g., oxide layer) separates the gate electrode from contact with the region of the substrate between the source and drain regions. A first electrode contact is coupled to the drain region of the MOSFET at one end and terminates at a surface. The surface of the first electrode contact is coated with a phase change material. A second electrode contact is provided having a surface coated with a layer of phase change material. The PRAM element includes at least one columnar member formed from a phase change material interposed between the phase change material layer of the first electrode and phase change material layer of the second electrode. In certain embodiments, a plurality of columnar members are interposed between the upper and lower layers of phase change material. Each of the columnar members are separated from one another via an insulator material.
Zuoming Te Zhao from San Jose, CA, age ~47 Get Report