William Chu

7672267, Mar 2, 2010

Apr 26, 2004

10/831329

Kirk Tsai - Potomac MD, US
William Chu - Vienna VA, US

Sybase 365, Inc. - Reston VA

H04W 4/00

370328, 370338, 37039521, 37039531, 370401, 455445

Network system and method for facilitating message exchange between mobile subscribers belonging to the same or different public land mobile networks, possibly incorporating different standards. Message exchange between two subscribers of the same or different networks may involve one or more lookups on subscription data, zero or more message transformations, one or more routing decisions including application of costing functions, and, storage and propagation of the message in one or more Core or Intermediary networks. The messages may be of type, among others, SMS (Short Message Service), MMS (Multimedia Message Service), or EMAIL. An aspect of the present invention provides a message routing subsystem that facilitates destination determination and delivery channel selection.

20090037315, Feb 5, 2009

Aug 3, 2007

11/716723

William Chu - Vienna VA, US

G06Q 99/00
G06F 17/30
G06F 17/40
G06Q 40/00

705 37, 705 1

Example embodiments relate to methods and systems for ranking a content submitted by an auditionee. The method may further include retrieving the content stored in a talent broker management system by a user, reviewing the submitted content, rating the content based on a ranking score, recording an IP address of the user, recording the submitted ranked content, and determining whether the user is a duplicate user that rates the same submitted content, wherein when the user is determined a duplicate, the system may reduce the ranking score of the duplicate user. The method may also allow auditionees to bid their submitted video to be displayed for a particular time slot.

55758886, Nov 19, 1996

Apr 14, 1995

8/422102

John Kosakowski - Laurel MD
William Chu - Poughkeepsie NY
Kelly W. Foster - Annadale VA
Christie R. K. Marrian - Marbury MD
Martin C. Peckerar - Silver Spring MD

The United States of America as represented by the Secretary of the Navy - Washington DC

H01L 213205

1566511

Sidewalls in a pattern of a refractory metal on a substrate are passivated during plasma etching by introducing water vapor into the etching chamber. This process obtains nearly vertical sidewalls. In one exemplified embodiment, a pattern of tungsten on a chromium etch step layer was reactive ion etched. In that embodiment, the reactive ion etching was intermittently paused. After each pause, the workpiece was warmed from below about 20. degree. C. to about room temperature. Then, water vapor was introduced into the etching chamber housing the workpiece. After the water vapor was introduced, the workpiece was cooled to below about 20. degree. C. and reactive ion etching was resumed. Alternatively, water vapor can be introduced into the etching chamber continuously during plasma etching.