US Patent:
20050064576, Mar 24, 2005
Inventors:
Donna Fennell - North Brunswick NJ, US
Max Haggblom - New York NY, US
Stephen Zinder - Ithaca NY, US
Ivonne Nijenhuis - Leipzig, DE
International Classification:
C12S001/00
Abstract:
The present invention relates to methods for remediating a material contaminated with a halogenated aromatic compound. Cultures containing strain 195 are disclosed which decontaminate halogenated aromatic compounds by removing at least one halogen group from the aromatic compound. The addition of a simple halogenated compound to a contaminated material is also provided for stimulating or supporting the growth of a dehalogenating organism thereby enhancing the bioremediation process of a contaminated material.