Inventors:
Samuel Martin Stavis - North Potomac MD, US
Elizabeth Arlene Strychalski - North Potomac MD, US
Michael Gaitan - North Potomac MD, US
Assignee:
The United States of America, as represented by the Secretary of Commerce, the National Institute of Standards and Technology - Washington DC
Cornell University—Cornell Center for Technology, Enterprise & Commercialization - Ithaca NY
International Classification:
B44C 1/22
C23F 1/00
US Classification:
216 41, 216 2, 216 58, 216 67, 430 5, 430313
Abstract:
A nanofabrication process for use with a photoresist that is disposed on a substrate includes the steps of exposing the photoresist to a grayscale radiation pattern, developing the photoresist to remove a irradiated portions and form a patterned topography having a plurality of nanoscale critical dimensions, and selectively etching the photoresist and the substrate to transfer a corresponding topography having a plurality of nanoscale critical dimensions into the substrate.