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Russell M Pon

from San Luis Obispo, CA
Age ~61
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Also known as:
Russell Te Pon, Michael Pon Russell
Related to:
Russell A Clark, 55Ben W Sun, 61Theresa My Pon, 78Edward Chin, 51Nicole PonMy Hieu Nguyen, 51Adam C Russell, 55Hau T Nguyen, 75Hai M Nguyen, 55Chin PonMh Nguyen, 51Gregory A Pon, 63Theresa M Pon, 52Tiffany T Luu, 48
Connected to:
Alexander C Pon, 100Barry M Pon, 57Chi K Pon, 48Chris Pon, 33Damira E Pon, 42Diana J Pon, 52Gail Pon, 55Garrett Pon, 38Joyce P Pon, 71Lei M Pon, 67

Russell Pon Phones & Addresses

  • San Luis Obispo, CA
  • 2336 Oleaster Dr, San Ramon, CA 94583 (925) 309-4081
  • 222 Marigold St, Danville, CA 94506
  • Mountain View, CA
  • Tucson, AZ
  • San Jose, CA
  • Santa Clara, CA
  • Ann Arbor, MI
  • 2336 Oleaster Dr, San Ramon, CA 94582

Work

Company: Clarity medical systems, inc. Mar 2011 to Mar 2017 Position: Senior optical engineer

Education

Degree: Bachelors, Bachelor of Arts School / High School: Albion College Specialities: Mathematics, Physics

Skills

Optics • R&D • Medical Devices • Laser • Design of Experiments • Metrology • Zemax • Testing • Optical Engineering • Photonics • Biomedical Engineering • Design Control • Design For Manufacturing • Sensors • Image Processing • Optical Fiber • Digital Imaging • Spectroscopy • Solidworks • Semiconductors • Interferometry

Emails

t***[email protected]

Industries

Medical Devices

Resumes

Resumes

Russell Pon Photo 1

Senior Optical Engineer

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Location:
2336 Oleaster Dr, San Ramon, CA 94582
Industry:
Medical Devices
Work:
Clarity Medical Systems, Inc. Mar 2011 - Mar 2017
Senior Optical Engineer
Bio-Rad Laboratories Mar 2011 - Mar 2017
Senior Optical Engineer
Molecular Devices 2008 - Apr 2011
Senior Optical Engineer
Johnson & Johnson 2002 - 2008
Laser and Optical Metrology Engineer
Education:
Albion College
Bachelors, Bachelor of Arts, Mathematics, Physics University of Arizona
Master of Science, Doctorates, Masters, Doctor of Philosophy University of Michigan
Bachelors, Bachelor of Science, Electrical Engineering
Skills:
Optics
R&D
Medical Devices
Laser
Design of Experiments
Metrology
Zemax
Testing
Optical Engineering
Photonics
Biomedical Engineering
Design Control
Design For Manufacturing
Sensors
Image Processing
Optical Fiber
Digital Imaging
Spectroscopy
Solidworks
Semiconductors
Interferometry

Publications

Us Patents

Method Of Fabricating Porous Membrane With Unique Pore Structure For Aerosolized Delivery Of Drugs

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US Patent:
6551542, Apr 22, 2003
Filed:
Nov 8, 2000
Appl. No.:
09/710612
Inventors:
Rajesh S. Patel - Fremont CA
Sudarsan Srinivasan - Fremont CA
Russell M. Pon - Danville CA
Jeffrey A. Schuster - Berkeley CA
Igor Gonda - San Francisco CA
Assignee:
Aradigm Corporation - Hayward CA
International Classification:
B23K 2600
US Classification:
264400, 21912167, 21912171, 21912172, 12820022, 12820023, 12820024
Abstract:
A method for producing a nozzle useful in generating a fine aerosol for delivery of therapeutic or diagnostic agents is provided. The method comprises focusing a laser source onto a thin, preferably flexible material so as to form pores substantially through the material. The pores are formed to have an unflexed exit aperture diameter in the range of about 0. 5 to about 25 microns, depending on the size of the aerosol particles desired for a particular application. The nozzle may have a variety of shapes and be distributed in a variety of patterns. An elevated area can be formed around the exit aperture of the nozzle in order to prevent intrusion of liquid into the nozzle.

Method And Device For Non-Destructive Analysis Of Perforation In A Material

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US Patent:
6624885, Sep 23, 2003
Filed:
Jun 10, 1999
Appl. No.:
09/330254
Inventors:
Russell M. Pon - Danville CA
Rajesh S. Patel - Fremont CA
James M. Bovatsek - San Jose CA
Jeffrey A. Schuster - Berkeley CA
Geoffrey K. McKinley - Palo Alto CA
Assignee:
Aradigm Corporation - Hayward CA
International Classification:
G01N 2100
US Classification:
3562376
Abstract:
A method for inspecting small holes in a material is disclosed. The method comprises directing a light source through the holes in the material, and then focusing the light passing through the material onto a CCD detector. The focusing techniques allow for a reduction in the size of the image which must be inspected, thereby increasing sample throughput, while still allowing for detailed inspection of the hole number and quality. Methods of producing an aerosolization container and device comprising membranes which pass such an inspection are also provided.

Inspection System Simultaneously Utilizing Monochromatic Darkfield And Broadband Brightfield Illumination Sources

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US Patent:
20020054291, May 9, 2002
Filed:
Nov 5, 2001
Appl. No.:
10/010394
Inventors:
Russell Pon - Santa Clara CA, US
International Classification:
G01B011/00
US Classification:
356/394000
Abstract:
A method and inspection system to inspect a first pattern on a specimen for defects against a second pattern that is intended to be the same where the second pattern has known responses to at least one probe. The inspection is performed by applying at least one probe to a point of the first pattern on the specimen to generate at least two responses from the specimen. Then the first and second responses are detected from the first pattern, and each of those responses is then compared with the corresponding response from the same point of the second pattern to develop first and second response difference signals. Those first and second response difference signals are then processed together to unilaterally determine a first pattern defect list.

Optical Inspection Of A Specimen Using Multi-Channel Responses From The Specimen

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US Patent:
20030063274, Apr 3, 2003
Filed:
Nov 7, 2002
Appl. No.:
10/290415
Inventors:
Russell Pon - Santa Clara CA, US
International Classification:
G01N021/00
US Classification:
356/237500
Abstract:
A method and inspection system to inspect a first pattern on a specimen for defects against a second pattern that is intended to be the same where the second pattern has known responses to at least one probe. The inspection is performed by applying at least one probe to a point of the first pattern on the specimen to generate at least two responses from the specimen. Then the first and second responses are detected from the first pattern, and each of those responses is then compared with the corresponding response from the same point of the second pattern to develop first and second response difference signals. Those first and second response difference signals are then processed together to unilaterally determine a first pattern defect list.

Optical Inspection Of A Specimen Using Multi-Channel Responses From The Specimen

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US Patent:
20040017562, Jan 29, 2004
Filed:
Jul 28, 2003
Appl. No.:
10/628805
Inventors:
Russell Pon - Santa Clara CA, US
Assignee:
KLA INSTRUMENTS CORPORATION
International Classification:
G01N021/00
US Classification:
356/237500
Abstract:
A method and inspection system to inspect a first pattern on a specimen for defects against a second pattern that is intended to be the same where the second pattern has known responses to at least one probe. The inspection is performed by applying at least one probe to a point of the first pattern on the specimen to generate at least two responses from the specimen. Then the first and second responses are detected from the first pattern, and each of those responses is then compared with the corresponding response from the same point of the second pattern to develop first and second response difference signals. Those first and second response difference signals are then processed together to unilaterally determine a first pattern defect list.

Optical Inspection Of A Specimen Using Multi-Channel Responses From The Specimen

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US Patent:
20040223146, Nov 11, 2004
Filed:
Jun 17, 2004
Appl. No.:
10/870771
Inventors:
Russell Pon - Santa Clara CA, US
Assignee:
KLA INSTRUMENTS CORPORATION
International Classification:
G01N021/00
US Classification:
356/237500
Abstract:
A method and inspection system to inspect a first pattern on a specimen for defects against a second pattern that is intended to be the same where the second pattern has known responses to at least one probe. The inspection is performed by applying at least one probe to a point of the first pattern on the specimen to generate at least two responses from the specimen. Then the first and second responses are detected from the first pattern, and each of those responses is then compared with the corresponding response from the same point of the second pattern to develop first and second response difference signals. Those first and second response difference signals are then processed together to unilaterally determine a first pattern defect list.

Optical Inspection Of A Specimen Using Multi-Channel Responses From The Specimen

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US Patent:
20050162645, Jul 28, 2005
Filed:
Mar 23, 2005
Appl. No.:
11/087941
Inventors:
Russell Pon - Santa Clara CA, US
International Classification:
G01N021/88
US Classification:
356237500
Abstract:
A method and inspection system to inspect a first pattern on a specimen for defects against a second pattern that is intended to be the same where the second pattern has known responses to at least one probe. The inspection is performed by applying at least one probe to a point of the first pattern on the specimen to generate at least two responses from the specimen. Then the first and second responses are detected from the first pattern, and each of those responses is then compared with the corresponding response from the same point of the second pattern to develop first and second response difference signals. Those first and second response difference signals are then processed together to unilaterally determine a first pattern defect list.

Optical Inspection Of A Specimen Using Multi-Channel Responses From The Specimen

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US Patent:
20060146319, Jul 6, 2006
Filed:
Mar 8, 2006
Appl. No.:
11/370786
Inventors:
Russell Pon - Santa Clara CA, US
International Classification:
G01N 21/88
US Classification:
356237500
Abstract:
A method and inspection system to inspect a first pattern on a specimen for defects against a second pattern that is intended to be the same where the second pattern has known responses to at least one probe. The inspection is performed by applying at least one probe to a point of the first pattern on the specimen to generate at least two responses from the specimen. Then the first and second responses are detected from the first pattern, and each of those responses is then compared with the corresponding response from the same point of the second pattern to develop first and second response difference signals. Those first and second response difference signals are then processed together to unilaterally determine a first pattern defect list.
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Russell M Pon from San Luis Obispo, CA, age ~61 Get Report