Inventors:
Keenan L. Evans - Tempe AZ
Hang M. Liaw - Scottsdale AZ
Jong-Kai Lin - Chandler AZ
Assignee:
Motorola, Inc. - Schaumburg IL
International Classification:
C23C 1434
H01L 21324
Abstract:
A method for enhancing aluminum nitride includes, in one version, annealing sputtered aluminum nitride in a reducing atmosphere (11), and subsequently annealing the sputtered aluminum nitride in an inert atmosphere (12). A superior aluminum nitride thin film (13) results. The films can withstand exposure to boiling water for times up to twenty minutes and maintain a refractive index, N. sub. f, greater than 2. 0, and a preferred crystalline orientation ratio, I(002)/I(102), in excess of 1000.