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Joel Frendt Phones & Addresses

  • 8000 Federal Way, Boise, ID 83716 (208) 385-0153
  • 2090 Cole Rd, Boise, ID 83709 (208) 322-5968
  • 7255 Colonial St, Boise, ID 83709 (208) 322-5968

Publications

Us Patents

Coated Beads And Process Utilizing Such Beads For Forming An Etch Mask Having A Discontinuous Regular Pattern

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US Patent:
6464888, Oct 15, 2002
Filed:
Jan 12, 2000
Appl. No.:
09/482187
Inventors:
Joel M. Frendt - Boise ID
Assignee:
Micron Technology, Inc. - Boise ID
International Classification:
H01J 904
US Classification:
216 11, 216 24, 216 42, 216 79, 445 50
Abstract:
A process for forming an etch mask having a discontinuous regular pattern utilizes beads, each of which has a substantially unetchable core covered by a removable spacer coating.

Coated Beads And Process Utilizing Such Beads For Forming An Etch Mask Having A Discontinuous Regular Pattern

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US Patent:
6562438, May 13, 2003
Filed:
Jan 12, 2000
Appl. No.:
09/482189
Inventors:
Joel M. Frendt - Boise ID
Assignee:
Micron Technology, Inc. - Boise ID
International Classification:
H01J 904
US Classification:
428143
Abstract:
A process for forming an etch mask having a discontinuous regular pattern utilizes beads, each of which has a substantially unetchable core covered by a removable spacer coating. Beads which have a core and a spacer coating are dispensed as a hexagonally-packed monolayer onto a thermo-adhesive layer, which is on a target layer. The beads are kept in place by a bead confinement wall. Following a vibrational step which facilitates hexagonal packing of the beads, the resultant assembly is heated so that the beads adhere to the adhesive layer. Excess beads are then discarded. Spacer shell material is then removed from each of the beads, leaving core etch masks. The core-masked target layer is then plasma etched to form a column of target material directly beneath each core. The cores and any spacer material underneath the cores are removed. The resulting circular island of target material may be used as an etch mask during wet isotropic etching of an underlying layer.

Coated Beads And Process Utilizing Such Beads For Forming An Etch Mask Having A Discontinuous Regular Pattern

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US Patent:
6676845, Jan 13, 2004
Filed:
Jul 22, 2002
Appl. No.:
10/200850
Inventors:
Joel M. Frendt - Boise ID
Assignee:
Micron Technology, Inc. - Boise ID
International Classification:
H01J 904
US Classification:
216 42, 216 11, 216 24, 438 20, 438739, 438945, 445 51
Abstract:
A process for forming an etch mask having a discontinuous regular pattern utilizes beads, each of which has a substantially unetchable core covered by a removable spacer coating. Beads which have a core and a spacer coating are dispensed as a hexagonally-packed monolayer onto a thermo-adhesive layer, which is on a target layer. The beads are kept in place by a bead confinement wall. Following a vibrational step which facilitates hexagonal packing of the beads, the resultant assembly is heated so that the beads adhere to the adhesive layer. Excess beads are then discarded. Spacer shell material is then removed from each of the beads, leaving core etch masks. The core-masked target layer is then plasma etched to form a column of target material directly beneath each core. The cores and any spacer material underneath the cores are removed. The resulting circular island of target material may be used as an etch mask during wet isotropic etching of an underlying layer.

Coated Beads For Forming An Etch Mask Having A Discontinuous Regular Pattern

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US Patent:
6706386, Mar 16, 2004
Filed:
Oct 16, 2002
Appl. No.:
10/272602
Inventors:
Joel M. Frendt - Boise ID
Assignee:
Micron Technology, Inc. - Boise ID
International Classification:
H01J 904
US Classification:
428323, 428325, 428328
Abstract:
A process for forming an etch mask having a discontinuous regular pattern utilizes beads, each of which has a substantially unetchable core covered by a removable spacer coating. Beads which have a core and a spacer coating are dispensed as a hexagonally-packed monolayer onto a thermo-adhesive layer, which is on a target layer. The beads are kept in place by a bead confinement wall. Following a vibrational step which facilitates hexagonal packing of the beads, the resultant assembly is heated so that the beads adhere to the adhesive layer. Excess beads are then discarded. Spacer shell material is then removed from each of the beads, leaving core etch masks. The core-masked target layer is then plasma etched to form a column of target material directly beneath each core. The cores and any spacer material underneath the cores are removed. The resulting circular island of target material may be used as an etch mask during wet isotropic etching of an underlying layer.

Coated Beads And Process Utilizing Such Beads For Forming An Etch Mask Having A Discontinuous Regular Pattern

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US Patent:
6824855, Nov 30, 2004
Filed:
Mar 27, 2003
Appl. No.:
10/400849
Inventors:
Joel M. Frendt - Boise ID
Assignee:
Micron Technology, Inc. - Boise ID
International Classification:
H01J 904
US Classification:
428143
Abstract:
A process for forming an etch mask having a discontinuous regular pattern utilizes beads, each of which has a substantially unetchable core covered by a removable spacer coating. Beads which have a core and a spacer coating are dispensed as a hexagonally packed mono-layer onto a thermo-adhesive layer, which is on a target layer. The beads are kept in place by a bead confinement wall. Following a vibrational step which facilitates hexagonal packing of the beads, the resultant assembly is heated so that the beads adhere to the adhesive layer. Excess beads are then discarded. Spacer shell material is then removed from each of the beads, leaving core etch masks. The core-masked target layer is then plasma etched to form a column of target material directly beneath each core. The cores and any spacer material underneath the cores are removed. The resulting circular island of target material may be used as an etch mask during wet isotropic etching of an underlying layer.

Coated Beads And Process Utilizing Such Beads For Forming An Etch Mask Having A Discontinuous Regular Pattern

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US Patent:
7029592, Apr 18, 2006
Filed:
Aug 11, 2003
Appl. No.:
10/639123
Inventors:
Joel M. Frendt - Boise ID,
Assignee:
Micron Technology, Inc. - Boise ID
International Classification:
H01J 9/04
US Classification:
216 42, 216 11, 216 24, 438 20, 438739, 438945, 445 51
Abstract:
A process for forming an etch mask having a discontinuous regular pattern utilizes beads, each of which has a substantially unetchable core covered by a removable spacer coating. Beads are dispensed as a hexagonally packed monolayer onto a thermo-adhesive layer. Following a vibrational step which facilitates hexagonal packing of the beads, the resultant assembly is heated so that the beads adhere to the adhesive layer. Excess beads are then discarded. Spacer shell material is then removed from each of the beads, leaving core etch masks. The core-masked target layer is then plasma etched to form a column of target material directly beneath each core. The cores and any spacer material underneath the cores are removed. The resulting circular island of target material may be used as an etch mask during wet isotropic etching of an underlying layer.

Coated Beads And Process Utilizing Such Beads For Forming An Etch Mask Having A Discontinuous Regular Pattern

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US Patent:
6051149, Apr 18, 2000
Filed:
Mar 12, 1998
Appl. No.:
9/041829
Inventors:
Joel M. Frendt - Boise ID
Assignee:
Micron Technology, Inc. - Boise ID
International Classification:
H01J 904
US Classification:
216 42
Abstract:
A process for forming an etch mask having a discontinuous regular pattern utilizes beads, each of which has a substantially unetchable core covered by a removable spacer coating. Beads which have a core and a spacer coating are dispensed as a hexagonally-packed monolayer onto a thermo-adhesive layer, which is on a target layer. The beads are kept in place by a bead confinement wall. Following a vibrational step which facilitates hexagonal packing of the beads, the resultant assembly is heated so that the beads adhere to the adhesive layer. Excess beads are then discarded. Spacer shell material is then removed from each of the beads, leaving core etch masks. The core-masked target layer is then plasma etched to form a column of target material directly beneath each core. The cores and any spacer material underneath the cores are removed. The resulting circular island of target material may be used as an etch mask during wet isotropic etching of an underlying layer.
Joel M Frendt from Boise, ID, age ~60 Get Report