Jay B Dedontney

6352592, Mar 5, 2002

Jan 27, 2000

09/492420

Lawrence Duane Bartholomew - Felton CA
Jay Brian DeDontney - Santa Cruz CA
Christopher A. Peabody - Menlo Park CA

Silicon Valley Group, Thermal Systems LLC - Scotts Valley CA

C23C 1600

118719, 118715, 118729

A protective shield and a semiconductor processing system including a protective shield is provided. The shield includes a frame assembly including a pair of spaced end walls and a pair of side walls extending between and mounted to the end walls, and a plurality of shield bodies carried by the frame assembly. Each of the shield bodies includes a base having a continuous unit frame, a perforated sheet carried by said continuous frame, a plenum between the base and the perforated sheet, and a gas delivery device for delivering an inert gas to the plenum at a flow rate such that the gas diffuses through the perforated sheet. The chemical vapor deposition system includes a plurality of processing chambers, a conveyor for transporting substrates through the processing chambers, buffer modules isolating the processing chambers from the rest of the process path all enclosed within a muffle, a protective shield mounted in the processing chambers includes injector shield bodies positioned adjacent the injector and shunt shield bodies spaced from the injector shield bodies, an inlet port between the injector shield bodies, and an outlet port between the shunt shield bodies for the flow of reagents through the protective shield. The shunt shield bodies each include a plenum filled with an inert gas and a bottom outlet port coupled to the plenum for delivering a supply of inert gas below the protective shield to form buffer barriers on opposite sides of the injection ports. The shield body captures the perforated sheets and shield bodies such that the sheets and shield body base can freely expand and contract relative to each other and the end walls under varying temperature conditions, maintaining the precise chamber geometry control required for CVD processing.

6859617, Feb 22, 2005

Aug 16, 2001

09/931307

Arthur J. Goodsel - St. Clair MI, US
Jay DeDontney - Prunedale CA, US

Thermo Stone USA, LLC - Marina CA

H05B003/40

392478, 219543

A resistance heater for heating fluids including a fluid-permeable porous substrate. An electrically conductive porous thin film is deposited on the porous substrate. An electrical connector coupled to the thin film and adapted to provide an electrical circuit through said thin film to effect heating of said thin film in order to heat a fluid passing through the pours of the thin film and substrate. A method of making and using a resistance heater is also disclosed.

6890386, May 10, 2005

Jul 12, 2002

10/194639

Jay Brian DeDontney - Prunedale CA, US
Richard H. Matthiesen - Scotts Valley CA, US
Samuel Kurita - Scotts Valley CA, US

Aviza Technology, Inc. - Scotts Valley CA

C23F001/00
H01L021/306
C23C016/00

118715, 15634533

An injector and exhaust assembly for providing delivery of gas to a substrate is provided. The injector and exhaust assembly comprises at least two injectors positioned adjacent each other and spaced apart to form at least one exhaust channel therebetween, and a mounting plate for securing the at least two injectors, wherein each of the at least two injectors being individually mounted to or removed from the mounting plate, and the mounting plate being provided with at least one exhaust slot in fluid communication with the at least one exhaust channel. An exhaust assembly is coupled to the mounting plate to remove exhaust gases from the injectors.

6921437, Jul 26, 2005

May 26, 2004

10/854869

Jay Brian DeDontney - Prunedale CA, US
Jack Chihchieh Yao - Scotts Valley CA, US

Aviza Technology, Inc. - Scotts Valley CA

C23C016/00
C23F001/00
H01L021/306

118715, 118728, 15634529, 15634533, 15634534, 15634535, 15634536

The present invention provides a gas distribution apparatus useful in semiconductor manufacturing. The gas distribution apparatus comprises a unitary member and a gas distribution network formed within the unitary member for uniformly delivering a gas into a process region. The gas distribution network is formed of an inlet passage extending upwardly through the upper surface of the unitary member for connecting to a gas source, a plurality of first passages converged at a junction and connected with the inlet passage at the junction, a plurality of second passages connected with the plurality of first passages, and a plurality of outlet passages connected with the plurality of second passages for delivering the gas into a processing region. The first passages extend radially and outwardly from the junction to the periphery surface of the unitary member, and the second passages are non-perpendicular to the first passages and extend outwardly from the first passages to the periphery surface. The outlet passages extend downwardly through the lower surface of the unitary member for delivering the gas into the processing region.

8277888, Oct 2, 2012

Dec 20, 2011

13/332104

Jay Brian Dedontney - Prunedale CA, US

Intermolecular, Inc. - San Jose CA

C23C 16/455
C23C 16/44
C23F 1/00
H01L 21/306
C23C 16/06
C23C 16/22

4272481, 118715, 118728, 118 50, 15634529, 15634533, 15634534, 15634526

An apparatus for deploying two fluids separately into a reaction chamber is provided. The apparatus includes a first distribution network that is formed on a plate having a distribution face and a dispensing face. The first distribution network is defined by a plurality of recessed channels on the distribution face. The plurality of recessed channels includes a plurality of thru-ports that extend from the plurality of recessed channels to the dispensing face. The apparatus further includes a second distribution network that has passages formed below the plurality of recessed channels and above the dispensing face. A first set of ports extends from the passages to the distribution face and a second set of ports extends from a top surface of the distribution face to the dispensing face.

8293013, Oct 23, 2012

Dec 30, 2008

12/346195

Jay Brian DeDontney - San Jose CA, US

Intermolecular, Inc. - San Jose CA

C23C 16/455
C23C 16/44
C23F 1/00
H01L 21/306
C23C 16/06
C23C 16/22

118715, 118728, 118 50, 15634529, 15634533, 15634534, 15634526, 4272481

An apparatus for deploying two fluids separately into a reaction chamber is provided. The apparatus includes a first distribution network that is formed on a plate having a distribution face and a dispensing face. The first distribution network is defined by a plurality of recessed channels on the distribution face. The plurality of recessed channels includes a plurality of thru-ports that extend from the plurality of recessed channels to the dispensing face. The apparatus further includes a second distribution network that has passages formed below the plurality of recessed channels and above the dispensing face. A first set of ports extends from the passages to the distribution face and a second set of ports extends from a top surface of the distribution face to the dispensing face.

8402845, Mar 26, 2013

Aug 28, 2012

13/596884

Jay B. Dedontney - Prunedale CA, US

Intermolecular, Inc. - San Jose CA

G01N 19/00
G01F 1/00
C23F 1/00
H01L 21/306
C23C 16/455
C23C 16/44
B67D 7/30
C23C 16/06
C23C 16/22

738659, 118728, 118 50, 118715, 15634529, 15634533, 15634534, 15634526, 4272481, 73861, 222 14, 222 59, 222 71

An apparatus for deploying two fluids separately into a reaction chamber is provided. The apparatus includes a first distribution network that is formed on a plate having a distribution face and a dispensing face. The first distribution network is defined by a plurality of recessed channels on the distribution face. The plurality of recessed channels includes a plurality of thru-ports that extend from the plurality of recessed channels to the dispensing face. The apparatus further includes a second distribution network that has passages formed below the plurality of recessed channels and above the dispensing face. A first set of ports extends from the passages to the distribution face and a second set of ports extends from a top surface of the distribution face to the dispensing face.

20020134507, Sep 26, 2002

Jul 13, 2001

09/905349

Jay DeDontney - Santa Cruz CA, US
Anthony DeSa - Anaheim CA, US
Samuel Kurita - Scotts Valley CA, US

Silicon Valley Group, Thermal Systems LLC - Scotts Valley CA

C23F001/00
C23C016/00

156/345330, 118/715000

A gas delivery metering tube is provided. The gas delivery metering tube includes a two axially aligned nested tubes wherein the inner and outer tubes receive a gas through one end of the assembly and the inner tube conveys gas to the opposite end of the outer tube. The outer tube contains one or more arrays of orifices. Conveying gas to the end of the outer tube opposite that connected to the gas inlet provides for more even backing pressure over the entire length of the gas delivery metering tube than can be achieved by allowing gas to enter only through a single inlet.