US Patent:
20230012173, Jan 12, 2023
Inventors:
- Tokyo, JP
Hiroyuki Kobayashi - Hillsboro OR, US
Takeshi Ohmori - Tokyo, JP
International Classification:
G05B 13/04
H01L 21/66
H01L 21/67
H01L 21/3065
G06N 20/00
G06T 7/00
Abstract:
To facilitate evaluation of a predicted process shape in process recipe development using machine learning, a process recipe search apparatus that searches for an etching recipe that is a parameter of a plasma processing apparatus set so as to etch a sample into a desired shape displays, on a display device, the predicted process shape of the sample by a candidate etching recipe predicted by using a machine leaning model, by highlighting a difference between the predicted process shape and a target shape.