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Hans K Pew

from Groton, MA
Age ~63

Hans Pew Phones & Addresses

  • 9 Elm St, Groton, MA 01450 (978) 272-1359 (978) 448-9676
  • 15 Davis Rd, Acton, MA 01720
  • 751 120, Orem, UT 84057 (801) 221-1484

Publications

Us Patents

Mobile Miniature X-Ray Source

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US Patent:
6661876, Dec 9, 2003
Filed:
Jul 29, 2002
Appl. No.:
10/208646
Inventors:
Clark Turner - Payson UT
Arturo Reyes - Orem UT
Hans K. Pew - Acton MA
Mark W. Lund - Orem UT
Michael Lines - Provo UT
Paul Moody - Sandy UT
Sergei Voronov - Provo UT
Assignee:
Moxtek, Inc. - Orem UT
International Classification:
H01J 3514
US Classification:
378138, 378119, 378102, 378123, 313553
Abstract:
A mobile, miniature x-ray source includes a low-power consumption cathode element for mobility, and an anode optic creating a field free region to prolong the life of the cathode element. An electric field is applied to an anode and a cathode that are disposed on opposite sides of an evacuated tube. The anode includes a target material to produce x-rays in response to impact of electrons. The cathode includes a cathode element to produce electrons that are accelerated towards the anode in response to the electric field between the anode and the cathode. The tube can have a length less than approximately 3 inches, and a diameter or width less than approximately 1 inch. The cathode element can include a low-power consumption cathode element with a low power consumption less than approximately 1 watt. The power source can include a battery power source. A field-free region can be positioned at the anode to resist positive ion acceleration back towards the cathode element.

High Throughput Reflectivity And Resolution X-Ray Dispersive And Reflective Structures For The 100 Ev To 5000 Ev Energy Range And Method Of Making The Devices

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US Patent:
54854997, Jan 16, 1996
Filed:
Aug 5, 1994
Appl. No.:
8/286693
Inventors:
Hans K. Pew - Orem UT
David D. Allred - Provo UT
Assignee:
Moxtek, Inc. - Orem UT
International Classification:
G01T 132
US Classification:
378 84
Abstract:
X-ray dispersive and reflective structures utilizing special materials which exhibit improved performance in the specific ranges of interest. The structures are formed of alternating thin layers of uranium, uranium compound or uranium alloy and another spacer material consisting of elements or compounds with low absorptance chosen to match the wavelength of interest. These low index of refraction elements or compounds are those best suited for water window microscopy and nitrogen analysis, or are similar elements or compounds best suited for carbon analysis, boron analysis, and x-ray lithography. The structures are constructed using standard thin layer deposition techniques such as evaporation, sputtering, and CVD, or by novel methods which allow thinner and smoother layers to be deposited.
Hans K Pew from Groton, MA, age ~63 Get Report