Resumes
Resumes
Guenther Schubert Phones & Addresses
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63 Pleasantview Ave, Longmeadow, MA 01106 (413) 567-1797
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Springfield, MA
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Enfield, CT
Work
Position:
Production Occupations
Education
Degree:
High school graduate or higher
Publications
Us Patents
Electron Beam Welding Method And Apparatus
View pageUS Patent:
20060192144, Aug 31, 2006
Filed:
Feb 7, 2006
Appl. No.:
11/350184
Inventors:
Guenther Schubert - Longmeadow MA, US
Steven Delong - Enfield CT, US
Steven Delong - Enfield CT, US
Assignee:
PTR-Precision Technologies, Inc. - Enfield CT
International Classification:
G21G 5/00
US Classification:
250492100
Abstract:
An electron beam welding apparatus includes an electron beam generator for selectively emitting an electron beam into a weld chamber. The electron beam welding apparatus further includes a measuring device for detecting an intensity of the electron beam and a slit plate disposed between the electron beam generator and the measuring device. The slit plate permits passage of the electron beam through a slit formed in the slit plate, and the measuring device determines a location of the electron beam in dependence upon the detected intensity of the electron beam passing through the slit. The electron beam welding device further includes thermally non-conductive and/or absorbing materials strategically placed between parts to be welded and all components of mechanical assemblies requiring precision location.
Apparatus For Electron Beam Welding At Atmospheric Pressure
View pageUS Patent:
59518863, Sep 14, 1999
Filed:
Dec 23, 1997
Appl. No.:
8/998135
Inventors:
Guenther G. Schubert - Longmeadow MA
Joseph L. Lovett - Marlborough CT
Joseph L. Lovett - Marlborough CT
Assignee:
PTR Precision Technologies - Enfield CT
International Classification:
B23K 1510
US Classification:
21912113
Abstract:
Electron beam is focussed in a focussing column in a high vacuum environment and emitted downward through upper, middle, and lower orifices. A second stage vacuum housing concentrically surrounds a lower portion of the beam focussing column and separates the upper and middle orifices. A first stage vacuum housing concentrically surrounds the second stage vacuum housing and separates the middle and lower orifices. An outer wall surrounding the second housing tapers downward to the lower orifice, allowing it to be positioned as closely as desired to a workpiece regardless of surface topography. The apparatus comprises an orifice housing having an internal cavity which receives the lower part of the beam focussing column, an inner wall which defines the outer boundary of the second housing, and a support spool borne against by the outer wall, which is fixed to the bottom of the orifice housing and fixes the other components relative to each other in the housing.