Inventors:
Bruce W. Peuse - San Carlos CA, US
Yaozhi Hu - San Jose CA, US
Paul Janis Timans - Mountain View CA, US
Guangcai Xing - Fremont CA, US
Wilfried Lerch - Dornstadt, DE
Stephen E. Savas - Fremont CA, US
Georg Roters - Duelmen, DE
Zsolt Nenyei - Blaustein, DE
Ashok Sinha - Los Altos Hills CA, US
Assignee:
Mattson Technology, Inc. - Fremont CA
International Classification:
H01L 21/31
H01L 21/469
Abstract:
Plasma assisted low temperature radical oxidation is described. The oxidation is selective to metals or metal oxides that may be present in addition to the silicon being oxidized. Selectivity is achieved by proper selection of process parameters, mainly the ratio of H2 to O2 gas. The process window may be enlarged by injecting H2O steam into the plasma, thereby enabling oxidation of silicon in the presence of TiN and W, at relatively low temperatures. Selective oxidation is improved by the use of an apparatus having remote plasma and flowing radicals onto the substrate, but blocking ions from reaching the substrate.