Gokhan Percin

7444615, Oct 28, 2008

May 31, 2005

11/139551

Gokhan Percin - San Jose CA, US
Ram S. Ramanujam - San Jose CA, US
Franz X. Zach - Los Gatos CA, US
Abdurrahman Sezginer - Los Gatos CA, US
Roy Prasad - Los Gatos CA, US

Invarium, Inc. - San Jose CA

G06F 17/50

716 19, 716 1, 716 20, 716 21, 703 14

A method for generating an OPC model is provided which takes into consideration across-wafer variations which occur during the process of manufacturing semiconductor chips. More particularly, a method for generating an OPC model is provided which takes into consideration across-wafer variations which occur during the process of manufacturing semiconductor chips based on the parameters of test patterns measured at the “wafer sweet spots” so as to arrive at an accurate model.

7588868, Sep 15, 2009

Oct 22, 2004

10/971350

Franz X. Zach - Los Gatos CA, US
Abdurrahman Sezginer - Los Gatos CA, US
Gokhan Percin - Los Gatos CA, US

Cadence Design Systems, Inc. - San Jose CA

G03F 9/00
G03C 5/00

430 22, 430 30

First and second exposures of a mask onto a wafer are performed such that the exposure field of the second exposure partially overlaps the exposure field of the first exposure. A characteristic of a set of features is determined, and a value of a parameter of an optical proximity correction model is determined. An alignment feature can be used to align a measurement tool. In yet another embodiment, pupil intensity distribution of an imaging system is measured by exposing an image field of a radiation detector with a bright feature, positioning the detector at a distance away from the image plane, and exposing the image field of the detector with a bright feature, resulting in a cumulative exposure of the image field of the detector from the two exposures. A characteristic of a spatial pattern in the cumulative exposure of the image field of the detector is then determined.

7600212, Oct 6, 2009

Oct 2, 2006

11/541921

Franz X. Zach - Los Gatos CA, US
Jesus Carrero - San Jose CA, US
Bayram Yenikaya - Sunnyvale CA, US
Gokhan Percin - Los Gatos CA, US
Xuelong Cao - Fremont CA, US
Abdurrahman Sezginer - Los Gatos CA, US

Cadence Design Systems, Inc. - San Jose CA

G06F 17/50

716 19, 716 4, 716 21

A method for synthesizing a photomask data set from a given target layout, including the following steps: (a) providing a set of target polygons for the target layout; (b) fitting a smooth curve to a target polygon of the set of target polygons, the curve having a set of etch-target points; (c) moving the etch target points according to a model of an etch process to produce a set of lithography-target points; and (d) synthesizing a photomask data set based on a model of a lithography process and the set of lithography-target points.

8222065, Jul 17, 2012

Oct 2, 2009

12/587139

Peter Smeys - Mountain View CA, US
Peter Johnson - Sunnyvale CA, US
Gokhan Percin - Los Gatos CA, US

National Semiconductor Corporation - Santa Clara CA

H01L 29/72

438 51, 438381, 438393, 438396, 600459, 257416

A method for forming a capacitive micromachined ultrasonic transducer (CMUT) is provided that includes forming oxide features outwardly of a CMUT control chip in a silicon wafer. The oxide features are planarized. A silicon-on-insulator (SOI) wafer is bonded to the planarized oxide features. For a particular embodiment, the SOI wafer comprises a single crystal epitaxial layer, a buried oxide layer and a silicon layer, and the single crystal epitaxial layer is bonded to the planarized oxide features, after which the silicon layer and the buried oxide layer of the SOI wafer are removed, leaving the single crystal epitaxial layer bonded to the oxide layer.

8279409, Oct 2, 2012

Aug 5, 2009

12/536425

Abdurrahman Sezginer - Monte Sereno CA, US
Jesus Orsely Carrero - Mountain View CA, US
Tatung Chow - San Jose CA, US
Gokhan Percin - Los Gatos CA, US

Cadence Design Systems, Inc. - San Jose

G03B 27/32
G03B 27/54
G06F 17/50

355 77, 355 67, 716 50, 716 55

The present invention provides a method for calibrating a computational model of a lithography process by calculating a demerit function using an intensity measurement at a location of a wafer; and calibrating the lithography model or a mask making model by determining values of parameters of the computational model using the calculated demerit function. The method may also use a second demerit function that is defined by the sum of squares of differences between a simulated and measured critical dimensions of a feature on the wafer.

8563345, Oct 22, 2013

Mar 13, 2012

13/419216

Steven J. Adler - Saratoga CA, US
Peter Johnson - Sunnyvale CA, US
Gokhan Percin - Los Gatos CA, US
Shahram Mostafazadeh - San Jose CA, US

National Semiconductor Corporated - Santa Clara CA

H01L 29/72

438 50, 438 48, 257416, 310322, 600437

A method for forming a capacitive micromachined ultrasonic transducer (CMUT) includes forming multiple CMUT elements in a first semiconductor-on-insulator (SOI) structure. Each CMUT element includes multiple CMUT cells. The first SOI structure includes a first handle wafer, a first buried layer, and a first active layer. The method also includes forming a membrane over the CMUT elements and forming electrical contacts through the first handle wafer and the first buried layer. The electrical contacts are in electrical connection with the CMUT elements. The membrane could be formed by bonding a second SOI structure to the first SOI structure, where the second SOI structure includes a second handle wafer, a second buried layer, and a second active layer. The second handle wafer and the second buried layer can be removed, and the membrane includes the second active layer.

20010035700, Nov 1, 2001

Feb 27, 2001

09/795812

Gokhan Percin - Los Altos CA, US
Butrus Khuri-Yakub - Palo Alto CA, US

The Board of Trustees of the Leland Stanford Junior University

H01L041/04

310/324000, 310/328000

A transducer suitable for ultrasonic applications, fluid drop ejection and scanning force microscopy. The transducer comprises a thin piezoelectric ring bonded to a thin fully supported clamped membrane. Voltages applied to said piezoelectric ring excite axisymmetric resonant modes in the clamped membrane.

20010038402, Nov 8, 2001

Feb 22, 2001

09/791991

Gokhan Percin - Los Altos CA, US
Butrus Khuri-Yakub - Palo Alto CA, US

B41J002/04

347/054000

A droplet ejector including a cylindrical reservoir closed at one end with an elastic membrane including at least one aperture. A bulk actuator at the other end for actuating the fluid for ejection through the aperture. Also disclosed is a micromachined two-dimensional array droplet ejector. The ejector includes a two-dimensional array of elastic membranes having orifices closing the ends of cylindrical fluid reservoirs. The fluid in the ejectors is bulk actuated to set up pressure waves in the fluid which cause fluid to form a meniscus at each orifice. Selective actuation of the membranes ejects droplets. In an alternative mode of operation, the bulk pressure wave has sufficient amplitude to eject droplets while the individual membranes are actuated to selectively prevent ejection of droplets.