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Eliezer E Rosengaus

from Seattle, WA
Age ~68
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Also known as:
Eliezer Te Rosengaus, Eliezer K Rosengaus, Eliezer T Rosengaus, Eliezer C Rosengaus, Elezer Rosengaus, Eliezer S
Phone and address:
588 Bell St #3407S, Seattle, WA 98121
Related to:
Michel RosengausDeborah M Rosengaus, 38Jacqueline RosengausGregorio K Rosengaus, 90Aaron J Rosengaus, 36Michelle E Atchison, 51Manuel Frumkin, 69Ruth M Rosengaus, 38Leah Rosengaus, 33Gregory K Rosengaus, 97Joalyce S Frumkin
Connected to:
Barry Rosengarten, 84Bonnie J Rosengarten, 37Fred S Rosengart, 63Gayle M Rosengartner, 73Gloria Rosengarten, 89Harriet I Rosengarten, 80Jason R Rosengard, 37Joyce C Rosengarten, 82Lee A Rosengard, 72Paulette Rosengarten, 80

Eliezer Rosengaus Phones & Addresses

    s
  • 588 Bell St #3407S, Seattle, WA 98121
  • Oakland, CA
  • San Bruno, CA
  • 3704 Ortega Ct, Palo Alto, CA 94303 (510) 845-4943 (650) 856-4297
  • 3704 Ortega Ct, Palo Alto, CA 94303

Work

Position: Machine Operators, Assemblers, and Inspectors Occupations

Education

Degree: Graduate or professional degree

Emails

e***[email protected]

Resumes

Resumes

Eliezer Rosengaus Photo 1

Systems Architect

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Location:
Seattle, WA
Work:
Roche
Systems Architect
Education:
Princeton University 1978 - 1982
Doctorates, Doctor of Philosophy, Philosophy
Skills:
Microsoft Excel
Microsoft Word
Eliezer Rosengaus Photo 2

Principal Engineer

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Location:
3704 Ortega Ct, Palo Alto, CA 94303
Industry:
Internet
Work:
Amazon
Principal Engineer
Education:
Princeton University 1977 - 1982
Doctorates, Doctor of Philosophy, Physics
Eliezer Rosengaus Photo 3

Eliezer Rosengaus

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Publications

Us Patents

System And Method For Inspecting Semiconductor Wafers

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US Patent:
6791680, Sep 14, 2004
Filed:
Dec 30, 1999
Appl. No.:
09/474941
Inventors:
Eliezer Rosengaus - Palo Alto CA
Steven R. Lange - Alamo CA
Assignee:
KLA-Tencor Corporation - San Jose CA
International Classification:
G01N 2188
US Classification:
3562372, 3562375
Abstract:
A method for inspecting semiconductor wafers is provided in which a plurality of independent, low-cost, optical-inspection subsystems are packaged and integrated to simultaneously perform parallel inspections of portions of the wafer, the wafer location relative to the inspection being controlled so that the entire wafer is imaged by the system of optical subsystems in a raster-scan mode. A monochromatic coherent-light source illuminates the wafer surface. A darkfield-optical system collects scattered light and filters patterns produced by valid periodic wafer structures using Fourier filtered. The filtered light is processed by general purpose digital-signal processors. Image subtraction methods are used to detect wafer defects, which are reported to a main computer to aid in statistical process control, particularly for manufacturing equipment.

Illumination Delivery System

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US Patent:
6796697, Sep 28, 2004
Filed:
May 7, 2002
Appl. No.:
10/140486
Inventors:
Chris Bragg - Oakland CA
Daniel Scott - San Jose CA
Eliezer Rosengaus - Palo Alto CA
Assignee:
KLA-Tencor, Inc. - San Jose CA
International Classification:
F21V 704
US Classification:
362554, 362330, 362331, 362268, 362558
Abstract:
An illumination delivery system provides a spatially and angularly uniform shaped beam output with sufficient intensity to illuminate a sample surface for defect inspection. Light is transmitted through a shaped fiber optic bundle, a homogenizer, a diffuser, and an optional focusing optics system.

Full Swath Analysis

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US Patent:
7024339, Apr 4, 2006
Filed:
Oct 18, 2004
Appl. No.:
10/967838
Inventors:
Krishnamurthy Bhaskar - San Jose CA, US
Mark J. Roulo - Mountain View CA, US
John S. Taylor - San Jose CA, US
Lawrence R. Miller - Los Altos CA, US
Paul T. Russell - Scotts Valley CA, US
Jason Z. Lin - Saratoga CA, US
Eliezer Rosengaus - Palo Alto CA, US
Richard M. Wallingford - San Jose CA, US
Kishore Bubna - Fremont CA, US
Assignee:
KLA-Tencor Technologies Corporation - Milpitas CA
International Classification:
G06F 15/00
US Classification:
702185
Abstract:
An inspection system for detecting anomalies on a substrate. A first network is coupled to a sensor array and communicates image data. Process nodes are coupled to the first network, and processes the data to produce reports. Each process node has an interface card that formats the data for a high speed interface bus that is coupled to the interface card. A computer receives and processes the data to produce the anomaly report. A second network receives the anomaly reports from the process nodes. A job manager is coupled to the second network, and receives the anomaly reports from the process nodes and sends information to the process nodes to coordinate the processing of the data in the process nodes.

Systems And Methods For Inspection Of Specimen Surfaces

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US Patent:
7072034, Jul 4, 2006
Filed:
Sep 25, 2001
Appl. No.:
09/965408
Inventors:
Eliezer Rosengaus - Palo Alto CA, US
Lydia Young - Palo Alto CA, US
Assignee:
KLA-Tencor Corporation - San Jose CA
International Classification:
G01N 21/88
US Classification:
3562375
Abstract:
Systems and methods for contact image sensor based inspection of specimens are provided. A system configured to inspect a specimen may include a contact image sensor. The contact image sensor may include a light source configured to direct light toward a surface of the specimen and a linear sensor array configured to detect light returned from the surface. The system may further include a processor configured to determine a presence of defects on the surface using the detected light. A method for inspecting the specimen may include directing light from a light source toward a surface of the specimen and detecting light returned from the surface using a linear sensor array. The light source and the linear sensor array may be arranged in a contact image sensor. The method may further include determining a presence of defects on the surface from the detected light.

Memory Load Balancing

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US Patent:
7076390, Jul 11, 2006
Filed:
Oct 18, 2004
Appl. No.:
10/967397
Inventors:
Krishnamurthy Bhaskar - San Jose CA, US
Mark J. Roulo - Mountain View CA, US
John S. Taylor - San Jose CA, US
Lawrence R. Miller - Los Altos CA, US
Paul T. Russell - Scotts Valley CA, US
Jason Z. Lin - Saratoga CA, US
Eliezer Rosengaus - Palo Alto CA, US
Richard M. Wallingford - San Jose CA, US
Kishore Bubna - Fremont CA, US
Assignee:
KLA-Tencor Technologies Corporation - Milpitas CA
International Classification:
G06F 15/00
US Classification:
702117, 702185
Abstract:
An inspection system for detecting anomalies on a substrate. A first network is coupled to a sensor array and communicates data. Process nodes are coupled to the first network, and process the data to produce reports. Each process node includes memory sufficient to buffer the data until it can process the data. Each process node has an interface card that formats the data for a high speed interface bus that is coupled to the interface card. A computer receives and processes the data to produce the report. A second network receives the reports. A job manager is coupled to the second network, receives the reports, and sends information to the process nodes to coordinate processing of the data.

Edge Bead Removal Inspection By Reflectometry

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US Patent:
7142300, Nov 28, 2006
Filed:
Apr 22, 2004
Appl. No.:
10/829727
Inventors:
Eliezer Rosengaus - Palo Alto CA, US
Assignee:
KLA-Tencor Corp. Technologies - Milpitas CA
International Classification:
G01J 4/00
US Classification:
356369
Abstract:
A method and apparatus for enhancing image contrast between resist-covered and bare silicon regions of a wafer, applicable to Edge Bead Removal inspection. The wafer is illuminated separately by s-polarized light and p-polarized light impinging at near the Brewster angle of silicon or resist, and an image difference between the reflected s-polarized light and the reflected p-polarized light is derived.

Programmable Image Computer

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US Patent:
7149642, Dec 12, 2006
Filed:
Oct 18, 2004
Appl. No.:
10/967388
Inventors:
Krishnamurthy Bhaskar - San Jose CA, US
Mark J. Roulo - Mountain View CA, US
John S. Taylor - San Jose CA, US
Lawrence R. Miller - Los Altos CA, US
Paul T. Russell - Scotts Valley CA, US
Jason Z. Lin - Saratoga CA, US
Eliezer Rosengaus - Palo Alto CA, US
Richard M. Wallingford - San Jose CA, US
Kishore Bubna - Fremont CA, US
Assignee:
KLA-Tencor Technologies Corporation - Milpitas CA
International Classification:
G06F 15/00
US Classification:
702117, 702122, 702185
Abstract:
An inspection system for detecting anomalies on a substrate. A first network is coupled to a sensor array and communicates data. Process nodes are coupled to the first network, and process the data to produce reports. Each process node has an interface card that formats the data for a high speed interface bus that is coupled to the interface card. A computer receives and processes the data to produce the report. A second network receives the reports. A job manager is coupled to the second network, receives the reports, and sends information to the process nodes to coordinate processing of the data.

Resolution Enhancement For Macro Wafer Inspection

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US Patent:
7176433, Feb 13, 2007
Filed:
Nov 17, 2004
Appl. No.:
10/992244
Inventors:
Eliezer Rosengaus - Palo Alto CA, US
Assignee:
KLA-Teacor Technologies Corporation - Milpitas CA
International Classification:
H01L 27/00
G01N 21/00
G01N 21/88
G01N 21/84
US Classification:
2502081, 25055905, 25055906, 25055907, 2505594, 356431, 3562374, 3562375
Abstract:
A method and apparatus for improving system resolution for a defect line scanner while not increasing aliasing effects, or alternatively to maintain system resolution for a defect scanner while decreasing aliasing effects. This is accomplished by decreasing effective pixel size for a CCD array defect line scanner while not decreasing signal-to-noise ratio, with minimal changes to the current machine. The method utilizes a sampling phase shift between successive lines of a multi-line sensor array during scanning.
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Eliezer E Rosengaus from Seattle, WA, age ~68 Get Report