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Edward J Gipstein

from Saratoga, CA
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Also known as:
E Gipstein
Phone and address:
19762 Charters Ave, Saratoga, CA 95070
(408) 867-4461
Related to:
Ruth G Gipstein, 96
Connected to:
Christopher J Gira, 44Jerome H Gira, 96John D Gira, 37Timothy M Gira, 46Harold R Girado, 77Michael J Girage, 64Anthony Giragossian, 64Arlen A Giragosian, 36Christopher V Giragosian, 39Frank G Giragosian, 62

Edward Gipstein Phones & Addresses

  • 19762 Charters Ave, Saratoga, CA 95070 (408) 867-4461
  • 19762 Charters Ave, Saratoga, CA 95070

Work

Position: Professional/Technical

Education

Degree: Graduate or professional degree

Public records

Vehicle Records

Edward Gipstein

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Address:
19762 Charters Ave, Saratoga, CA 95070
Phone:
(408) 867-4461
VIN:
JH4CU26659C035619
Make:
ACURA
Model:
TSX
Year:
2009

Publications

Us Patents

Positive Resists Containing Dimethylglutarimide Units

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US Patent:
39649083, Jun 22, 1976
Filed:
Sep 22, 1975
Appl. No.:
5/615652
Inventors:
Joachim Bargon - Los Gatos CA
Edward Gipstein - Saratoga CA
Hiroyuki Hiraoka - Los Gatos CA
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G03C 500
G03C 524
US Classification:
96 351
Abstract:
A process for forming an image with a positive resist using a polymer containing dimethylglutarimide units. The polymer is sensitive to both electron beam and light radiation, has a high glass transition temperature, a high temperature resistance, and is capable of very fine spatial resolution, very suitable for micro circuitry processings.

Positive Polymeric Electron Beam Resists Of Very Great Sensitivity

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US Patent:
39963934, Dec 7, 1976
Filed:
Mar 25, 1974
Appl. No.:
5/454058
Inventors:
Charles A. Cortellino - Wappingers Falls NY
Edward Gipstein - Saratoga CA
William A. Hewett - Saratoga CA
Duane E. Johnson - Los Gatos CA
Wayne M. Moreau - Wappingers Falls NY
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
B05D 306
US Classification:
427 43
Abstract:
It has been discovered that the sensitivity of positive acting polymeric electron beam resists is increased by well over an order of magnitude by using polymers having a molecular weight of at least one million, thereby making it possible to reduce the required radiation to below 3. times. 10. sup. sup. -6 coulombs/cm. sup. 2.

Electron Beam Positive Resists Containing Acetate Polymers

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US Patent:
39314359, Jan 6, 1976
Filed:
Dec 20, 1974
Appl. No.:
5/534541
Inventors:
Edward Gipstein - Saratoga CA
Wayne M. Moreau - Wappingers Falls NY
Omar U. Need - San Jose CA
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
B05D 306
US Classification:
427 43
Abstract:
Very sensitive electron beam positive resists have been obtained using films of polymeric methyl methacrylate containing acetate polymers.

Preparation Of Resist Image With Methacrylate Polymers

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US Patent:
40113515, Mar 8, 1977
Filed:
Jan 29, 1975
Appl. No.:
5/545063
Inventors:
Edward Gipstein - Saratoga CA
Wayne M. Moreau - Wappingers Falls NY
Omar U. Need - San Jose CA
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
B05D 306
G03C 500
US Classification:
427 43
Abstract:
A positive resist image is produced by exposure of a layer of non-crosslinked polymeric material to high energy radiation in a predetermined pattern, the polymeric material containing alkyl methacrylate units and polymerized units of certain other ethylenically unsaturated monomers, followed by removal of the electron degraded material from the exposed areas.

Use Of Nitrocellulose Containing 10.5 To 12% Nitrogen As Electron Beam Positive Resists

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US Patent:
39859150, Oct 12, 1976
Filed:
Dec 20, 1974
Appl. No.:
5/534542
Inventors:
Edward Gipstein - Saratoga CA
Wayne M. Moreau - Wappingers Falls NY
Omar U. Need - San Jose CA
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
B05D 306
US Classification:
427 43
Abstract:
Very sensitive electron beam positive resists have been obtained using films of nitrocellulose containing 10. 5 to 12% nitrogen.

Thermally Stable Positive Polycarbonate Electron Beam Resists

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US Patent:
39610993, Jun 1, 1976
Filed:
Sep 26, 1974
Appl. No.:
5/509593
Inventors:
Edward Gipstein - Saratoga CA
Wayne M. Moreau - Wappingers Falls NY
Omar U. Need - San Jose CA
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
B05D 306
US Classification:
427 43
Abstract:
Electron beam positive resists which are sensitive to electron beam radiation and simultaneously thermally stable are prepared using polycarbonates.
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Edward J Gipstein from Saratoga, CA Get Report