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Delbert L Lessor

from Richland, WA
Age ~83

Delbert Lessor Phones & Addresses

  • 1930 Cypress Pl, Richland, WA 99352 (509) 943-9422
  • Kiona, WA

Publications

Us Patents

Non-Thermal Plasma Reactor And Method-Structural Conductor

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US Patent:
6692704, Feb 17, 2004
Filed:
Mar 19, 2001
Appl. No.:
09/812071
Inventors:
David Emil Nelson - Waterford MI
Bob X. Li - Grand Blanc MI
Mark David Hemingway - Columbiaville MI
Suresh Baskaran - Kennewick WA
Joachim Kupe - Davisburg MI
Gregory Stephen Sims - Detroit MI
Delbert L. Lessor - Richland WA
Carl Elmer Miller - Millington MI
Darrell R. Herling - Kennewick WA
Assignee:
Delphi Technologies, Inc. - Troy MI
International Classification:
B01J 1908
US Classification:
42218604
Abstract:
A non-thermal plasma (NTP) reactor structural conductor element includes a base conductor support and a high dielectric constant (âhigh kâ) barrier layer supported by and substantially surrounding the base conductor support to form a structural conductor NTP reactor element. The structural conductor element may comprise a variety of shapes such as plates, sheets, half-box, I shapes, C shapes, or comb shapes, among others. In one embodiment, the dielectric barrier layer includes a coating applied to the base conductor support. In another embodiment, the dielectric barrier layer includes a high k film laminated to the base conductor support. In yet another embodiment, the base conductor support integrally forms the dielectric barrier layer via conversion of surfaces of the base conductor using electrochemical, thermal or chemical means to form the dielectric barrier layer.

Non-Thermal Plasma Reactor Substrate Design-E-Shape With Low Loss Electrode Pattern

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US Patent:
6821493, Nov 23, 2004
Filed:
Mar 28, 2002
Appl. No.:
10/114010
Inventors:
David Emil Nelson - Independence Township MI
Bob Xiaobin Li - Grand Blanc MI
Delbert L. Lessor - Richland WA
Assignee:
Delphi Technologies, Inc. - Troy MI
International Classification:
B01J 1908
US Classification:
42218604, 60275, 427404
Abstract:
A low-loss electrode-printed structural dielectric barrier for a non-thermal plasma reactor and non-thermal plasma multi-cell stacks having low-loss electrodes. The low-loss electrode-printed structural dielectric barriers include a structural dielectric barrier having a first side and a second opposite side; a low-loss electrode pattern disposed on the second side of the structural dielectric barrier; the low-loss electrode pattern comprising first and second major electrode sections that are offset from any ribs, supports, ligaments, spacers, tines, or other structure that serves as a structural dielectric connection between dielectric barriers in a multi-cell stack, a connector disposed between and electrically connecting the first and second major electrode sections and offset relative to a centerline perpendicular to the rib orientation, and a bus path connector electrically connected to one of the major electrode sections and offset relative to the centerline.

Processes And Apparatuses For Treating Halogen-Containing Gases

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US Patent:
6962679, Nov 8, 2005
Filed:
Jul 11, 2001
Appl. No.:
09/905654
Inventors:
Gary B. Josephson - Richland WA, US
Delbert L. Lessor - Richland WA, US
Amit K. Sharma - Burlington NJ, US
Christopher Lyle Aardahl - Richland WA, US
Kenneth G. Rappe - Richland WA, US
Assignee:
Battelle Memorial Institute - Richland WA
International Classification:
A62D003/00
US Classification:
423241, 423240 R
Abstract:
There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as Fthat involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water.

Processes For Treating Halogen-Containing Gases

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US Patent:
7220396, May 22, 2007
Filed:
Jan 13, 2003
Appl. No.:
10/341783
Inventors:
Christopher L. Aardahl - Sequim WA, US
Rick J. Orth - Kennewick WA, US
Kenneth G. Rappé - Richland WA, US
Delbert L. Lessor - Richland WA, US
Gary B. Josephson - Richland WA, US
Assignee:
Battelle Memorial Institute - Richland WA
International Classification:
B01D 53/50
US Classification:
423240R, 588311, 588312, 588406
Abstract:
There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as Fthat involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water. According to another embodiment, a vaporized portion of a liquid reducing agent is mixed with the halogen-containing gas to produce a reaction mixture and a non-thermal plasma is generated in the reaction gas mixture to reduce the halogen-containing gas.

Processes And Apparatuses For Treating Halogen-Containing Gases

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US Patent:
7407635, Aug 5, 2008
Filed:
Dec 16, 2003
Appl. No.:
10/738686
Inventors:
Gary B. Josephson - Richland WA, US
Delbert L. Lessor - Richland WA, US
Amit K. Sharma - Burlington NJ, US
Christopher Lyle Aardahl - Richland WA, US
Kenneth G. Rappe - Richland WA, US
Assignee:
Battelle Memorial Institute - Richland WA
International Classification:
B01J 19/08
US Classification:
42218604, 204252
Abstract:
There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as Fthat involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water.

Method And Apparatus For Improving Heat Transfer In A Fluidized Bed

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US Patent:
48906670, Jan 2, 1990
Filed:
Oct 17, 1988
Appl. No.:
7/259240
Inventors:
Delbert L. Lessor - Richland WA
Robert J. Robertus - Richland WA
Assignee:
Battelle Memorial Institute - Richland WA
International Classification:
F28D 1300
F28F 1314
US Classification:
165 1
Abstract:
An apparatus contains a fluidized bed that includes particles of different triboelectrical types, each particle type acquiring an opposite polarity upon contact. The contact may occur between particles of the two types or between particles of etiher type and structure or fluid present in the apparatus. A fluidizing gas flow is passed through the particles to produce the fluidized bed. Immersed within the bed are electrodes. An alternating EMF source connected to the electrodes applies an alternating electric field across the fluidized bed to cause particles of the first type to move relative to particles of the second type and relative to the gas flow. In a heat exchanger incorporating the apparatus, the electrodes are conduits conveying a fluid to be heated. The two particle types alternately contact each conduit to transfer heat from a hot gas flow to the second fluid within the conduit.
Delbert L Lessor from Richland, WA, age ~83 Get Report