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Darrin Leonhardt Phones & Addresses

  • 12221 Mcdonald Chapel Dr, Gaithersburg, MD 20878 (301) 990-1894
  • 14 Briarstone Ln, Gaithersburg, MD 20877 (301) 990-1894
  • 17046 Downing St, Gaithersburg, MD 20877 (301) 990-1894
  • Merrifield, VA
  • Brook Park, OH
  • Hyattsville, MD

Work

Company: Heraeus noblelight america llc Feb 2020 Position: Head of innovation in china | director of us r and d | innovation team building

Education

Degree: Doctorates, Doctor of Philosophy School / High School: University of Maryland 1988 to 1995 Specialities: Physics, Philosophy

Skills

Cross Functional Team Leadership • Technical Leadership • R&D • Spectroscopy • Intellectual Property • Physics • Product Development • Optics • Strategic Planning • Sensors • Chemistry • Materials Science • Thin Films • Technology Integration • Project Management • Science • Scanning Electron Microscopy • Organic Chemistry • Semiconductors • Materials • Manufacturing • Engineering • Microsoft Project • Microsoft Office • Presentation Skills • Leadership • Global Team Leadership • Technology Product Development • R&D Best Practices • Cross Functional Collaborations • Plasma Physics • Physical Chemistry • Applied Physics • Uv Coating • Experimentation • Surface Analysis • Polymer Chemistry • Photopolymerization • Uv Led Design • Uv Lamp Design • Uv Applications • Photochemistry • Field Trials • Laser Physics • Photonics • Quantum Technology • Research • Uv Vis Nir • Data Analysis • Uv Disinfection • Surface Chemistry • Data Acquisition • Sputtering • Nanomaterials • Patents • Publications • Radiation Safety • Analytical Chemistry • Research and Development

Ranks

Certificate: Certification: Dot Hazmat Radiation Safety Officer

Emails

Industries

Research

Resumes

Resumes

Darrin Leonhardt Photo 1

Head Of Innovation In China | Director Of Us R And D | Innovation Team Building

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Location:
12221 Mcdonald Chapel Dr, Gaithersburg, MD 20878
Industry:
Research
Work:
Heraeus Noblelight America Llc
Head of Innovation In China | Director of Us R and D | Innovation Team Building

United States Naval Research Laboratory 1998 - 2007
Experimental Plasma Physicist | Principal Investigator | E-Beam, Plasma and Spectroscopy Expert

National Research Council/Naval Research Laboratory 1995 - 1997
Postdoctoral Research Fellow | National Academy of Sciences | Hardcore Spectroscopist

University of Maryland 1988 - 1995
Various Positions
Education:
University of Maryland 1988 - 1995
Doctorates, Doctor of Philosophy, Physics, Philosophy
Kent State University 1983 - 1988
Bachelors, Bachelor of Science, Physics, Chemistry
Berea High School
Skills:
Cross Functional Team Leadership
Technical Leadership
R&D
Spectroscopy
Intellectual Property
Physics
Product Development
Optics
Strategic Planning
Sensors
Chemistry
Materials Science
Thin Films
Technology Integration
Project Management
Science
Scanning Electron Microscopy
Organic Chemistry
Semiconductors
Materials
Manufacturing
Engineering
Microsoft Project
Microsoft Office
Presentation Skills
Leadership
Global Team Leadership
Technology Product Development
R&D Best Practices
Cross Functional Collaborations
Plasma Physics
Physical Chemistry
Applied Physics
Uv Coating
Experimentation
Surface Analysis
Polymer Chemistry
Photopolymerization
Uv Led Design
Uv Lamp Design
Uv Applications
Photochemistry
Field Trials
Laser Physics
Photonics
Quantum Technology
Research
Uv Vis Nir
Data Analysis
Uv Disinfection
Surface Chemistry
Data Acquisition
Sputtering
Nanomaterials
Patents
Publications
Radiation Safety
Analytical Chemistry
Research and Development
Certifications:
Certification: Dot Hazmat Radiation Safety Officer

Publications

Us Patents

Method And Apparatus For Producing An Ion-Ion Plasma Continuous In Time

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US Patent:
H002212, Apr 1, 2008
Filed:
Sep 26, 2003
Appl. No.:
10/672269
Inventors:
Scott G. Walton - Burke VA, US
Robert Meger - Crofton MD, US
Richard Fernsler - Annanadale VA, US
Darrin Leonhardt - Gaithersburg MD, US
Assignee:
The United States of America as represented by the Secretary of the Navy - Washington DC
International Classification:
C23F 1/00
C23C 16/00
US Classification:
1563454, 216 67, 118723 FE
Abstract:
An ion-ion plasma source, that features a processing chamber containing a large concentration of halogen or halogen-based gases. A second chamber is coupled to the processing chamber and features an electron source which produces a high energy electron beam. The high energy electron beam is injected into the processing chamber where it is shaped and confined by a means for shaping and confining the high energy electron beam. The high energy electron beam produced in the second chamber when injected into the processing chamber ionizes the halogen gas creating a dense, ion-ion plasma in the processing chamber that is continuous in time. A method for creating an ion-ion plasma continuous in time.

Spread Reflector For A Lamp Structure

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US Patent:
8251526, Aug 28, 2012
Filed:
Jul 1, 2009
Appl. No.:
12/496172
Inventors:
Darrin Leonhardt - Gaithersburg MD, US
Assignee:
Fusion UV Systems, Inc - Gaithersburg MD
International Classification:
G02B 7/182
G02B 5/10
US Classification:
359851, 359868
Abstract:
A spread primary reflector for a UV curing lamp employs a substrate that has been faceted. The facets may be produced by means of stamping, etching, or a combination of chemical-mechanical processes. The faceting randomizes the focusing effects of the primary reflector's elliptical curvature while maintaining a total directed energy output and hence a uniform irradiance of a work product. The reflector may be made of a stand-alone reflective material with a preformed faceting pattern, such as from a metal substrate and coated with an optical coating to tailor the reflective properties of the surface of the substrate.

Modular Magnetron

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US Patent:
8264150, Sep 11, 2012
Filed:
Jul 17, 2009
Appl. No.:
12/504736
Inventors:
Darrin Leonhardt - Gaithersburg MD, US
Assignee:
Fusion UV Systems, Inc. - Gaithersburg MD
International Classification:
H01J 25/50
US Classification:
315 3951, 315 3971, 315 3963, 315 3967, 313153, 313160
Abstract:
A modular magnetron for use in UV curing lamp assembly is disclosed. The modular magnetron includes a vacuum tube having a vacuum tube body, a top assembly, and a bottom assembly. The top assembly is configured to substantially overlay the vacuum tube. The bottom assembly is configured to substantially extend about the vacuum tube, the vacuum tube being positioned to partially protrude from the bottom assembly, the bottom assembly including a cooling assembly configured to employ a flexible clamp-type fitting about the vacuum tube body for substantially maintaining thermal and electrical conductivity. The top assembly is configured to be releasably fastened to the bottom assembly about the vacuum tube with removable fasteners.

Uv Led Based Lamp For Compact Uv Curing Lamp Assemblies

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US Patent:
8357878, Jan 22, 2013
Filed:
Dec 21, 2010
Appl. No.:
12/974335
Inventors:
Darrin Leonhardt - Gaithersburg MD, US
Charles H. Wood - Rockville MD, US
Pradyumna K. Swain - Gaithersburg MD, US
Assignee:
Fusion UV Systems - Gaithersburg MD
International Classification:
H05B 1/00
A21B 2/00
US Classification:
219201, 219390, 219405, 219411, 392416, 392418, 118725, 118724, 118 501
Abstract:
An ultraviolet (UV) LED-based lamp for UV curing lamp assemblies is disclosed. An array of UV emitting LEDs are packaged together and arranged along the length of a cylindrical lens to form a UV LED-based optical component assembly. The UV LED-based optical component assembly may be made to be modular. A UV LED lamp assembly may comprise a plurality of UV LED-based optical component assemblies arranged around a workpiece tube. The workpiece tube may be filled with an inert gas and may be made of quartz or glass. One or more curved back reflectors may be placed opposite the LED UV LED-based optical component assemblies to collect UV light escaping the workpiece tube and refocus the light to the other side of the workpiece. The UV LEDs may be arranged on a single surface or a multi-level tiered platform.

Elliptical Light Source For Ultraviolet (Uv) Curing Lamp Assemblies

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US Patent:
8507884, Aug 13, 2013
Filed:
Jan 5, 2012
Appl. No.:
13/344240
Inventors:
Pradyumna Kumar Swain - North Potomac MD, US
Darrin Leonhardt - Gaithersburg MD, US
David Allen Sprankle - Hagerstown MD, US
Charles H. Wood - Rockville MD, US
Assignee:
Heraeus Noblelight Fusion UV Inc. - Gaithersburg MD
International Classification:
G21K 5/04
G21K 5/02
US Classification:
250504R, 2504931
Abstract:
A light source having a substantially elliptical cross-section for UV curing lamp assemblies is disclosed. The light source has a pair of end sections and a central section of smaller diameter than the end sections. The end sections are each connected to the central section by a tapered section the diameter of each of which decreases from an end that mates with an end section toward an end that mates with the central section. Each of the end sections has a substantially elliptical cross-section. The central section and the tapered sections may have a substantially elliptical cross-section. The aspect ratio of the elliptical cross-section of the end sections and the central section of the light source is preferably about 2:1.

Electron Beam Enhanced Large Area Deposition System

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US Patent:
20050040037, Feb 24, 2005
Filed:
Aug 20, 2003
Appl. No.:
10/644567
Inventors:
Scott Walton - Burke VA, US
Darrin Leonhardt - Gaithersburg MD, US
Robert Meger - Crofton MD, US
Richard Fernsler - Annandale VA, US
Christorpher Muratore - Alexandria VA, US
International Classification:
C23C014/32
US Classification:
204298060, 204298160, 204298190
Abstract:
This invention provides a means to deposit thin films and coatings on a substrate using an electron beam generated plasma. The plasma can be used as an ion source in sputter applications, where the ions are used to liberate material from a target surface which can then condense on a substrate to form the film or coating. Alternatively, the plasma may be combined with existing deposition sources including those based on sputter or evaporation techniques. In either configuration, the plasma serves as a source of ion and radical species at the growing film surface in reactive deposition processes. The electron beam large area deposition system (EBELADS) is a new approach to the production of thin films or coatings up to and including several square meters.

Large Area Metallization Pretreatment And Surface Activation System

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US Patent:
20050230242, Oct 20, 2005
Filed:
Apr 14, 2004
Appl. No.:
10/825800
Inventors:
Darrin Leonhardt - Gaithersburg MD, US
Scott Walton - Burke VA, US
Robert Meger - Crofton MD, US
Christopher Muratore - Alexandria VA, US
International Classification:
C23C014/32
US Classification:
204192110, 204192320
Abstract:
A large area metallization pretreatment and surface activation system that uses an electron beam-produced plasma capable of delivering substantial ion and radical fluxes at low temperatures over large areas of an organic plastic or polymer material. The ion and radical fluxes physically and chemically alter the surface structure of the organic plastic or polymer material thereby improving the ability of a film to adhere to the material.

Electron Beam Enhanced Nitriding System (Ebens)

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US Patent:
20050281958, Dec 22, 2005
Filed:
Jun 22, 2004
Appl. No.:
10/874002
Inventors:
Scott Walton - Burke AV, US
Darrin Leonhardt - Gaithersburg MD, US
Robert Meger - Crofton MD, US
J. Fernsler - Annandale VA, US
Christopher Muratore - Alexandria VA, US
International Classification:
H05H001/20
US Classification:
427569000, 1187230FE
Abstract:
An electron beam enhanced nitriding system that passes a high-energy electron beam through nitrogen gas to form a low electron temperature plasma capable of delivering nitrogen ions and radicals to a substrate to be nitrided. The substrate can be mounted on an electrode, and the substrate can be biased and heated.
Darrin L Leonhardt from Gaithersburg, MD, age ~58 Get Report