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Charles W Pittman

from Belle Chasse, LA
Age ~43
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Also known as:
Charles Westley Pittman, Charles Westly Pittman, Charles W Pitman, Charle Pittman, Angela Earley, Angela Ritz, Darlene Tarlton, Mary Tarlton
Related to:
Jackie Mcdaniel, 64Josh J Moore, 38Ana L MoralesTracy Grekowicz, 49Timothy Mcdaniel, 63Kierin Mcanally, 56
Connected to:
Abigail Pittman, 40Alisa M Pittman, 57Amie I Pittman, 52Andy Pittman, 67Angela P Pittman, 64Angeli G Pittman, 67Arnold Pittman, 55Asa T Pittman, 45Aundra Pittman, 40Barron Pittman, 55

Charles Pittman Phones & Addresses

  • Belle Chasse, LA
  • Rosebush, MI
  • 3100 Rue Parc Fontaine APT 2119, New Orleans, LA 70131 (504) 912-4716
  • River Ridge, LA
  • 1500 Lorene Dr APT 5, Harvey, LA 70058 (504) 415-4683
  • S San Francisco, CA
  • Flint, MI
  • 1747 Oriole St, New Orleans, LA 70122 (504) 283-1501

Work

Company: C r pittman construction co Address: 3021 Franklin Ave, New Orleans, LA 70122 Phones: (504) 947-4771 Position: Executive Industries: Special Trade Contractors

Specialities

Buyer's Agent • Listing Agent

Professional Records

License Records

Charles Ronald Pittman

License #:
PE.0004723 - Expired
Category:
Civil Engineer
Issued Date:
May 31, 1955
Expiration Date:
Mar 31, 2008
Type:
Civil Engineer; Environmental Engineer

Charles Ronald Pittman

License #:
PLS.0003044 - Expired
Category:
Civil Engineer
Issued Date:
May 31, 1955
Expiration Date:
Mar 31, 2008

Resumes

Resumes

Charles Pittman Photo 1

Charles Pittman

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Location:
United States

Business Records

Name / Title
Company / Classification
Phones & Addresses
Charles Pittman
Executive
C R Pittman Construction Co
Special Trade Contractors
3021 Franklin Ave, New Orleans, LA 70122
Charles Pittman
Executive
C. R. Pittman Construction Co., Inc.
Construction · Special Trade Contractors, NEC
3021 Franklin Ave, New Orleans, LA 70122
(504) 947-4771, (504) 947-4811
Charles R. Pittman
PITTMAN BUILDERS, INC
3021 Franklin Ave, New Orleans, LA 70122
C/O Charles R Pittman, New Orleans, LA 70122
Charles R. Pittman
PITTMAN CONSTRUCTION CO. OF LA., INC
3021 Franklin Ave, New Orleans, LA 70122
C/O Charles R Pittman, New Orleans, LA 70122
3021 Franklin, New Orleans, LA 70122
Charles R. Pittman
President, Owner
C.R. PITTMAN CONSTRUCTION COMPANY, INC
Highway/Street Construction Industrial Building Construction
3021 Franklin Ave, New Orleans, LA 70122
1747 Oriole St, New Orleans, LA 70122
(504) 947-4771, (504) 947-4811
Charles F. Pittman
MM
View of Texas Homes, LC
Charles Pittman
Executive
C R Pittman Construction Co
Special Trade Contractors
3021 Franklin Ave, New Orleans, LA 70122

Publications

Us Patents

Cleaning Solutions Including Nucleophilic Amine Compound Having Reduction And Oxidation Potentials

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US Patent:
20020052301, May 2, 2002
Filed:
Nov 20, 2001
Appl. No.:
09/988545
Inventors:
Wai Lee - Fremont CA, US
Charles Pittman - Starkville MS, US
Robert Small - Satsuma AL, US
International Classification:
C11D001/00
US Classification:
510/175000, 510/176000, 510/178000
Abstract:
A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating agent is preferred to be included since it provides added stability and activity to the cleaning composition so that the composition has long term effectiveness. If a chelating agent is not present, the composition, while providing for adequate stripping and cleaning upon initial use of the composition following mixing, has only short term stability. In this latter instance, the nucleophilic amine compound and organic solvent components of the composition preferably are maintained separate from each other until it is desired to use the composition. Thereafter, the components are combined. Following use of the composition, the non-used portion of the composition can be disposed of or be reactivated by the addition of a chelating agent.

Cleaning Solutions Including Nucleophilic Amine Compound Having Reduction And Oxidation Potentials

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US Patent:
20030032567, Feb 13, 2003
Filed:
May 1, 2002
Appl. No.:
10/135695
Inventors:
Wai Lee - Fremont CA, US
Charles Pittman - Starkville MS, US
Robert Small - Satsuma AL, US
Assignee:
EKC Technology, Inc. - Hayward CA
International Classification:
C11D001/00
US Classification:
510/175000, 510/176000, 510/499000
Abstract:
A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating agent is preferred to be included since it provides added stability and activity to the cleaning composition so that the composition has long term effectiveness. If a chelating agent is not present, the composition, while providing for adequate stripping and cleaning upon initial use of the composition following mixing, has only short term stability. In this latter instance, the nucleophilic amine compound and organic solvent components of the composition preferably are maintained separate from each other until it is desired to use the composition. Thereafter, the components are combined. Following use of the composition, the non-used portion of the composition can be disposed of or be reactivated by the addition of a chelating agent.

Cleaning Solutions Including Nucleophilic Amine Compound Having Reduction And Oxidation Potentials

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US Patent:
20040198621, Oct 7, 2004
Filed:
Apr 19, 2004
Appl. No.:
10/826286
Inventors:
Wai Lee - Fremont CA, US
Charles Pittman - Starkville MS, US
Robert Small - Satsuma AL, US
International Classification:
C11D001/00
US Classification:
510/175000
Abstract:
A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating agent is preferred to be included since it provides added stability and activity to the cleaning composition so that the composition has long term effectiveness. If a chelating agent is not present, the composition, while providing for adequate stripping and cleaning upon initial use of the composition following mixing, has only short term stability. In this latter instance, the nucleophilic amine compound and organic solvent components of the composition preferably are maintained separate from each other until it is desired to use the composition. Thereafter, the components are combined. Following use of the composition, the non-used portion of the composition can be disposed of or be reactivated by the addition of a chelating agent.

Cleaning Solutions Including Nucleophilic Amine Compound Having Reduction And Oxidation Potentials

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US Patent:
20060003909, Jan 5, 2006
Filed:
Jul 15, 2005
Appl. No.:
11/181747
Inventors:
Wai Lee - Fremont CA, US
Charles Pittman - Starkville MS, US
Robert Small - Satsuma AL, US
International Classification:
C11D 7/32
US Classification:
510175000
Abstract:
A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating agent is preferred to be included since it provides added stability and activity to the cleaning composition so that the composition has long term effectiveness. If a chelating agent is not present, the composition, while providing for adequate stripping and cleaning upon initial use of the composition following mixing, has only short term stability. In this latter instance, the nucleophilic amine compound and organic solvent components of the composition preferably are maintained separate from each other until it is desired to use the composition. Thereafter, the components are combined. Following use of the composition, the non-used portion of the composition can be disposed of or be reactivated by the addition of a chelating agent.

Cleaning Solutions Including Nucleophilic Amine Compound Having Reduction And Oxidation Potentials

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US Patent:
20070078074, Apr 5, 2007
Filed:
Dec 5, 2006
Appl. No.:
11/633459
Inventors:
Wai Lee - Fremont CA, US
Charles Pittman - Starkville MS, US
Robert Small - Satsuma AL, US
International Classification:
C11D 7/32
US Classification:
510175000
Abstract:
A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating agent is preferred to be included since it provides added stability and activity to the cleaning composition so that the composition has long term effectiveness. If a chelating agent is not present, the composition, while providing for adequate stripping and cleaning upon initial use of the composition following mixing, has only short term stability. In this latter instance, the nucleophilic amine compound and organic solvent components of the composition preferably are maintained separate from each other until it is desired to use the composition. Thereafter, the components are combined. Following use of the composition, the non-used portion of the composition can be disposed of or be reactivated by the addition of a chelating agent.

Cleaning Solutions Including Nucleophilic Amine Compound Having Reduction And Oxidation Potentials

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US Patent:
61108812, Aug 29, 2000
Filed:
May 28, 1996
Appl. No.:
8/654007
Inventors:
Wai Mun Lee - Fremont CA
Charles U. Pittman - Starkville MS
Robert J. Small - Satsuma AL
Assignee:
EKC Technology, Inc. - Hayward CA
International Classification:
C11D 732
C11D 750
US Classification:
510175
Abstract:
A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating agent is preferred to be included since it provides added stability and activity to the cleaning composition so that the composition has long term effectiveness. If a chelating agent is not present, the composition, while providing for adequate stripping and cleaning upon initial use of the composition following mixing, has only short term stability. In this latter instance, the nucleophilic amine compound and organic solvent components of the composition preferably are maintained separate from each other until it is desired to use the composition. Thereafter, the components are combined. Following use of the composition, the non-used portion of the composition can be disposed of or be reactivated by the addition of a chelating agent.

Method Of Removing Etching Residue

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US Patent:
59118350, Jun 15, 1999
Filed:
Mar 27, 1997
Appl. No.:
8/826257
Inventors:
Wai Mun Lee - Fremont CA
Charles U. Pittman - Starkville MS
Robert J. Small - Satsuma AL
Assignee:
EKC Technology, Inc. - Hayward CA
International Classification:
B08B 308
C11D 330
C11D 343
US Classification:
134 13
Abstract:
A (method using a composition) for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent. The chelating agent is preferred to be included since it provides added stability and activity to the cleaning composition so that the composition has long term effectiveness. If a chelating agent is not present, the composition, while providing for adequate stripping and cleaning upon initial use of the composition following mixing, has only short term stability. In this latter instance, the nucleophilic amine compound and organic solvent components of the composition preferably are maintained separate from each other until it is desired to use the composition. Thereafter, the components are combined. Following use of the composition, the non-used portion of the composition can be disposed of or be reactivated by the addition of a chelating agent.

Cleaning Solutions Including Nucleophilic Amine Compound Having Reduction And Oxidation Potentials

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US Patent:
63198851, Nov 20, 2001
Filed:
Jun 26, 2000
Appl. No.:
9/603693
Inventors:
Wai Mun Lee - Fremont CA
Charles U. Pittman - Starkville MS
Robert J. Small - Satsuma AL
Assignee:
EKC Technologies, Inc. - Hayward CA
International Classification:
C11D 162
C11D 320
C11D 330
US Classification:
510175
Abstract:
A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating agent is preferred to be included since it provides added stability and activity to the cleaning composition so that the composition has long term effectiveness. If a chelating agent is not present, the composition, while providing for adequate stripping and cleaning upon initial use of the composition following mixing, has only short term stability. In this latter instance, the nucleophilic amine compound and organic solvent components of the composition preferably are maintained separate from each other until it is desired to use the composition. Thereafter, the components are combined. Following use of the composition, the non-used portion of the composition can be disposed of or be reactivated by the addition of a chelating agent.

Isbn (Books And Publications)

Organometallic Polymers

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Author

Charles U. Pittman

ISBN #

0121608506

Metal-Containing Polymeric Systems

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Author

Charles U. Pittman

ISBN #

0306418916

Metal-Containing Polymeric Materials

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Author

Charles U. Pittman

ISBN #

0306452952

Macromolecules Containing Metal And Metal-Like Elements

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Author

Charles U. Pittman

ISBN #

0470041897

Organoiron Polymers

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Author

Charles U. Pittman

ISBN #

0471450782

Macromolecules Containing Metal and Metal-Like Elements: A Half-Century of Metal- And Metalloid-Containing Polymers

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Author

Charles U. Pittman

ISBN #

0471458325

Macromolecules Containing Metal and Metal-Like Elements, A Half-Century of Metal- and Metalloid-Containing Polymers

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Author

Charles U. Pittman

ISBN #

0471466581

Macromolecules Containing Metal and Metal-Like Elements: Biomedical Applications

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Author

Charles U. Pittman

ISBN #

0471667374

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Charles W Pittman from Belle Chasse, LA, age ~43 Get Report