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Carl A Treadwell

from Menlo Park, CA
Age ~58

Carl Treadwell Phones & Addresses

  • 1990 Avy Ave, Menlo Park, CA 94025 (650) 391-9478
  • 1039 Windermere Ave, Menlo Park, CA 94025
  • Round Rock, TX
  • s
  • 373 Fantail Loop, Austin, TX 78734
  • Santa Clara, CA
  • 827 University Ave, Palo Alto, CA 94301 (650) 327-9609
  • West Orange, NJ
  • San Mateo, CA
  • 1990 Avy Ave, Menlo Park, CA 94025

Work

Position: Student

Publications

Us Patents

Defect Detection System

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US Patent:
6538730, Mar 25, 2003
Filed:
Apr 6, 2001
Appl. No.:
09/828269
Inventors:
Mehdi Vaez-Iravani - Los Gatos CA
Jeffrey Alan Rzepiela - Sunnyvale CA
Carl Treadwell - Menlo Park CA
Andrew Zeng - Milpitas CA
Robert Fiordalice - Austin TX
Assignee:
Kla-Tencor Technologies Corporation - Milpitas CA
International Classification:
G01N 2100
US Classification:
3562372, 3562374, 3562375
Abstract:
Scattered radiation from a sample surface is collected by means of a collector that collects radiation substantially symmetrically about a line normal to the surface. The collected radiation is directed to channels at different azimuthal angles so that information related to relative azimuthal positions of the collected scattered radiation about the line is preserved. The collected radiation is converted into respective signals representative of radiation scattered at different azimuthal angles about the line. The presence and/or characteristics of anomalies are determined from the signals. Alternatively, the radiation collected by the collector may be filtered by means of a spatial filter having an annular gap of an angle related to the angular separation of expected pattern scattering. Signals obtained from the narrow and wide collection channels may be compared to distinguish between micro-scratches and particles. Forward scattered radiation may be collected from other radiation and compared to distinguish between micro-scratches and particles.

Defect Detection System

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US Patent:
6862096, Mar 1, 2005
Filed:
Feb 6, 2003
Appl. No.:
10/360565
Inventors:
Mehdi Vaez-Iravani - Los Gatos CA, US
Jeffrey Alan Rzepiela - Sunnyvale CA, US
Carl Treadwell - Menlo Park CA, US
Andrew Zeng - Milpitas CA, US
Robert Fiordalice - Austin TX, US
Assignee:
KLA-Tencor Corporation - Milpitas CA
International Classification:
G01B011/30
US Classification:
356600, 3562434
Abstract:
Scattered radiation from a sample surface is collected by means of a collector that collects radiation substantially symmetrically about a line normal to the surface. The collected radiation is directed to channels at different azimuthal angles so that information related to relative azimuthal positions of the collected scattered radiation about the line is preserved. The collected radiation is converted into respective signals representative of radiation scattered at different azimuthal angles about the line. The presence and/or characteristics of anomalies are determined from the signals. Alternatively, the radiation collected by the collector may be filtered by means of a spatial filter having an annular gap of an angle related to the angular separation of expected pattern scattering. Signals obtained from the narrow and wide collection channels may be compared to distinguish between micro-scratches and particles. Forward scattered radiation may be collected from other radiation and compared to distinguish between micro-scratches and particles.

Defect Detection System

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US Patent:
20050018181, Jan 27, 2005
Filed:
Aug 16, 2004
Appl. No.:
10/919600
Inventors:
Mehdi Vaez-Iravani - Los Gatos CA, US
Jeffrey Rzepiela - Sunnyvale CA, US
Carl Treadwell - Menlo Park CA, US
Andrew Zeng - Milpitas CA, US
Robert Fiordalice - Austin TX, US
International Classification:
G01N021/00
US Classification:
356237100, 356237400
Abstract:
Scattered radiation from a sample surface is collected by means of a collector that collects radiation substantially symmetrically about a line normal to the surface. The collected radiation is directed to channels at different azimuthal angles so- that information related to relative azimuthal positions of the collected scattered radiation about the line is preserved. The collected radiation is converted into respective signals representative of radiation scattered at different azimuthal angles about the line. The presence and/or characteristics of anomalies are determined from the signals. Alternatively, the radiation collected by the collector may be filtered by means of a spatial filter having an annular gap of an angle related to the angular separation of expected pattern scattering. Signals obtained from the narrow and wide collection channels may be compared to distinguish between micro-scratches and particles. Forward scattered radiation may be collected from other radiation and compared to distinguish between micro-scratches and particles. Intensity of scattering is measured when the surface is illuminated sequentially by S- and P-polarized radiation and compared to distinguish between micro-scratches and particles. Representative films may be measured using profilometers or scanning probe microscopes to determine their roughness and by the above-described instruments to determine haze in order to build a database. Surface roughness of unknown films may then be determined by measuring haze values and from the database.

Apparatus And Method For Performing Multifunction Laser Processes

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US Patent:
20110008947, Jan 13, 2011
Filed:
Jun 17, 2010
Appl. No.:
12/817499
Inventors:
KEVIN LAUGHTON CUNNINGHAM - Mountain View CA, US
Carl Treadwell - Menlo Park CA, US
Tzay-Fa Su - San Jose CA, US
Uday Mahajan - Santa Clara CA, US
Sarin Sundar Jainnagar Kuppuswamy - Hyderabad, IN
Assignee:
APPLIED MATERIALS, INC. - Santa Clara CA
International Classification:
H01L 21/78
B23K 26/00
US Classification:
438463, 21912168, 257E21599
Abstract:
Embodiments of the present invention generally relate to a system used to form solar cell devices using processing modules adapted to perform one or more processes in the formation of the solar cell devices. In one embodiment, the system is adapted to form thin film solar cell devices by accepting a large unprocessed substrate and performing multiple deposition, material removal, cleaning, bonding, testing, and sectioning processes to form one or more complete, functional, and tested solar cell devices in custom sizes and/or shapes that can then be shipped to an end user for installation in a desired location to generate electricity. In one embodiment, the system is adapted to form one or more BIPV panels in custom sizes and/or shapes from a single large substrate for shipment to an end user.

Electron Beam Treatment Of Siloxane Resins

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US Patent:
61771430, Jan 23, 2001
Filed:
Jan 6, 1999
Appl. No.:
9/226347
Inventors:
Carl Treadwell - Palo Alto CA
Jingjun Yang - Cupertino CA
Matthew Ross - San Diego CA
International Classification:
C08F 248
C08J 704
H01L 5140
US Classification:
427515
Abstract:
Electron beam cured siloxane dielectric films and to a process for their manufacture which are useful in the production of integrated circuits. A siloxane polymer having in one aspect less than 40 Mole percent carbon containing substituents, and in another aspect at least approximately 40 Mole percent carbon containing substituents is cured by a wide beam electron beam exposure.
Carl A Treadwell from Menlo Park, CA, age ~58 Get Report