Binh A Tran

7768959, Aug 3, 2010

Apr 21, 2004

10/829131

James Chieh-Tsung Chen - Santa Clara CA, US
Chuong Vu - San Jose CA, US
Chor-Teck Law - Milpitas CA, US
Binh Quoc Tran - San Jose CA, US
Jiaqi Shen - Union City CA, US
Brian Bosso - San Jose CA, US

Marvell International Ltd. - Hamilton

H04Q 7/24

370328, 370310, 370338, 718 1

A method, apparatus, and computer-readable media for a wireless network device for communicating with a network comprises a memory to store an image comprising a plurality of virtual machines and only one multi-tasking operating system, wherein each of the virtual machines comprises a wireless network application to execute on the multi-tasking operating system; a processor to execute the virtual machines; and a port comprising a physical-layer device to communicate with the network, and a media access controller to communicate with the physical-layer device and the processor.

8018892, Sep 13, 2011

Jul 28, 2010

12/845315

James Chieh-Tsung Chen - Santa Clara CA, US
Chuong Vu - San Jose CA, US
Chor-Teck Law - Milpitas CA, US
Binh Quoc Tran - San Jose CA, US
Jiaqi Shen - Union City CA, US
Brian Bosso - San Jose CA, US

Marvell International Ltd. - Hamilton

H04W 4/00

370328, 370310, 370338, 718 1

A method, apparatus, and computer-readable media for a wireless network device for communicating with a network comprises a memory to store an image comprising a plurality of virtual machines and only one multi-tasking operating system, wherein each of the virtual machines comprises a wireless network application to execute on the multi-tasking operating system; a processor to execute the virtual machines; and a port comprising a physical-layer device to communicate with the network, and a media access controller to communicate with the physical-layer device and the processor.

8582507, Nov 12, 2013

Sep 12, 2011

13/230595

James Chieh-Tsung Chen - Santa Clara CA, US
Chuong Vu - San Jose CA, US
Chor-Teck Law - San Jose CA, US
Binh Quoc Tran - San Jose CA, US
Jiaqi Shen - Union City CA, US
Brian Bosso - Santa Clara CA, US

Marvell International Ltd. - Hamilton

H04W 4/00

370328, 370310, 370338, 718 1

A system to wirelessly communicate with a wireless network. The system includes a memory and a processor. The memory is configured to store a first queue, a second queue, and a processor queue. The processor is configured to: selectively execute a first virtual machine using the processor queue; while executing the first virtual machine, maintain the first queue as a copy of data in the processor queue; selectively execute a second virtual machine using the processor queue; and while executing the second virtual machine, maintain the second queue as a copy of data in the processor queue.

20020137312, Sep 26, 2002

Mar 2, 2001

09/798424

Lee Luo - Fremont CA, US
Henry Ho - San Jose CA, US
Shulin Wang - Campbell CA, US
Binh Tran - San Jose CA, US
Alexander Tam - Union City CA, US
Errol Sanchez - Dublin CA, US
Xianzhi Tao - Palo Alto CA, US
Steven Chen - San Jose CA, US

Applied Materials, Inc.

H01L021/20
H01L021/36
C30B001/00

438/492000, 438/935000

Provided herein is an emissivity-change-free pumping plate kit used in a single wafer chamber. This kit comprises a top open pumping plate, and optionally a skirt and/or a second stage choking plate. The skirt may be installed around the wafer heater, underneath the wafer heater, or along the chamber body inside the chamber. The choking plate is installed downstream of the top open pumping plate along the purge gas flow. Also provided is a method of preventing emissivity change and further providing optimal film thickness uniformity during wafer processing by utilizing such kit in the chamber.

20050109276, May 26, 2005

Aug 4, 2004

10/911208

R. Iyer - Santa Clara CA, US
Sean Seutter - San Jose CA, US
Jacob Smith - Santa Clara CA, US
Gregory Dibello - Mahopac NY, US
Alexander Tam - Union City CA, US
Binh Tran - San Jose CA, US
Sanjeev Tandon - Sunnyvale CA, US

C23C016/00

118715000, 427248100

A method and apparatus for a CVD chamber that provides uniform heat distribution, efficient precursor delivery, uniform distribution of process and inert chemicals, and thermal management of residues in the chamber and exhaust surfaces by changing the mechanical design of a single wafer thermal CVD chamber. The improvements include a processing chamber comprising a chamber body and a chamber lid defining a processing region, a substrate support disposed in the processing region, a gas delivery system mounted on the chamber lid, the gas delivery system comprising a lid, an adapter ring and two blocker plates that define a gas mixing region, and a face plate fastened to the adapter ring, a heating element positioned to heat the adapter ring to a desired temperature, and a temperature controlled exhaust system. The improvements also include a method for depositing a silicon nitride layer on a substrate, comprising vaporizing bis(tertiary-butylamino) silane, flowing the bis(tertiary-butylamino) silane into a processing chamber, flowing ammonia into a processing chamber, combining the two reactants in a mixer in the chamber lid, having an additional mixing region defined by an adapter ring and at least two blocker plates, heating the adapter ring, flowing the bis(tertiary-butylamino) silane through a gas distribution plate into a processing region above a substrate. The improvements reduce defects across the surface of the substrate and improve product yield.

20060102076, May 18, 2006

Oct 7, 2005

11/245758

Jacob Smith - Santa Clara CA, US
Sean Seutter - San Jose CA, US
R. Iyer - St. Paul MN, US
Binh Tran - San Jose CA, US
Alexander Tam - Union City CA, US
James Wilson - New Fairfield CT, US

C23C 16/00

118715000, 427248100

A method and apparatus for a chemical vapor deposition (CVD) chamber provides uniform heat distribution, uniform distribution of process chemicals in the CVD chamber, and minimization of by-product and condensate residue in the chamber. The improvements include a processing chamber comprising a chamber body, a base, and a chamber lid defining a processing region, a substrate support disposed in the processing region, a gas delivery system mounted on a chamber lid, the gas delivery system comprising an adapter ring and two blocker plates that define a gas mixing region, and a face plate fastened to the adapter ring, an exhaust system mounted at the base, a heating element positioned to heat the adapter ring; and a heating element positioned to heat a portion of the exhaust system.

20060281310, Dec 14, 2006

Jun 8, 2005

11/147938

Jacob Smith - Santa Clara CA, US
Alexander Tam - Union City CA, US
R. Iyer - Santa Clara CA, US
Sean Seutter - San Jose CA, US
Binh Tran - San Jose CA, US
Nir Merry - Mountain View CA, US
Adam Brailove - Gloucester MA, US
Robert Shydo - Andover MA, US
Robert Andrews - East Kingston NH, US
Frank Roberts - North Reading MA, US
Theodore Smick - Essex MA, US
Geoffrey Ryding - Manchester MA, US

H01L 21/44
C23C 16/00

438680000, 118719000

A method and apparatus for processing a substrate utilizing a rotating substrate support are disclosed herein. In one embodiment, an apparatus for processing a substrate includes a chamber having a substrate support assembly disposed within the chamber. The substrate support assembly includes a substrate support having a support surface and a heater disposed beneath the support surface. A shaft is coupled to the substrate support and a motor is coupled to the shaft through a rotor to provide rotary movement to the substrate support. A seal block is disposed around the rotor and forms a seal therewith. The seal block has at least one seal and at least one channel disposed along the interface between the seal block and the shaft. A port is coupled to each channel for connecting to a pump. A lift mechanism is coupled to the shaft for raising and lowering the substrate support.

20070125762, Jun 7, 2007

Dec 1, 2005

11/293626

Anqing Cui - Sunnyvale CA, US
Binh Tran - San Jose CA, US
Alexander Tam - Union City CA, US
Jacob Smith - Santa Clara CA, US
R. Iyer - Santa Clara MN, US
Joseph Yudovsky - Campbell CA, US
Sean Seutter - San Jose CA, US

H05B 3/68

219444100

Apparatus, reactors, and methods for heating substrates are disclosed. The apparatus comprises a stage comprising a body and a surface having an area to support a substrate, a shaft coupled to the stage, a first heating element disposed within a central region of the body of the stage, and at least second and third heating elements disposed within the body of the stage, the at least second and third heating elements each partially surrounding the first heating element and wherein the at least second and third heating elements are circumferentially adjacent to each other.