Resumes
Resumes
Barry Pinheiro Phones & Addresses
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153 Indian Ln, Media, PA 19063 (610) 892-9369
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Philadelphia, PA
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Indialantic, FL
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804 Powder Mill Ln, Wynnewood, PA 19096 (610) 642-0337 (610) 642-6524
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North Bay Village, FL
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153 Indian Ln, Media, PA 19063
Work
Position:
Sales Occupations
Education
Degree:
Associate degree or higher
Emails
Publications
Us Patents
Molding A Polishing Pad Having Integral Window
View pageUS Patent:
6387312, May 14, 2002
Filed:
Sep 20, 2000
Appl. No.:
09/666418
Inventors:
John V. H. Roberts - Newark DE
Barry Scott Pinheiro - Media PA
David B. James - Newark DE
Barry Scott Pinheiro - Media PA
David B. James - Newark DE
Assignee:
Rodel Holdings Inc. - Wilmington DE
International Classification:
B29B 700
US Classification:
26432816, 264348, 425548
Abstract:
A polishing pad is formed by solidifying a flowable polymeric material at different rates of cooling to provide a polishing pad with a transparent region and an adjacent opaque region. Types of polymeric material suitable for making the polishing pad include a single thermoplastic material, a blend of thermoplastic materials, and a reactive thermosetting polymer.
Polishing Pad Having An Advantageous Micro-Texture And Methods Relating Thereto
View pageUS Patent:
6641471, Nov 4, 2003
Filed:
Oct 20, 2000
Appl. No.:
09/693401
Inventors:
Barry Scott Pinheiro - Media PA
Steven Naugler - Hockessin DE
Steven Naugler - Hockessin DE
Assignee:
Rodel Holdings, INC - Wilmington DE
International Classification:
B24D 1700
US Classification:
451526, 451 56, 451443
Abstract:
A statistically uniform micro-texture on a polishing pad surface improves break-in preconditioning time, and is measured by: Land Surface Roughness, Ra, from about 0. 01 m to about 25 m; Average Peak to Valley Roughness, Rtm, from about 2 m to about 40 m; Core roughness depth, Rk, from about 1 to about 10; Reduced Peak Height, Rpk, from about 0. 1 to about 5; Reduced Valley Height, Rvk, from about 0. 1 to about 10; and Peak density expressed as a surface area ratio, R , ([Surf. Area/(Area-1)]), 0. 001 to 2.
Polishing Pad Having An Advantageous Micro-Texture And Methods Relating Thereto
View pageUS Patent:
6679769, Jan 20, 2004
Filed:
Feb 2, 2001
Appl. No.:
09/775972
Inventors:
Barry Scott Pinheiro - Media PA
Steven Naugler - Hockessin DE
Mary Jo Kulp - Macungis PA
Steven Naugler - Hockessin DE
Mary Jo Kulp - Macungis PA
Assignee:
Rodel Holdings, INC - Wilmington DE
International Classification:
B24D 328
US Classification:
451526, 51298
Abstract:
This invention relates to polishing pads and a method for making the polishing pad surface readily machineable thereby facilitating permanent alteration of the polishing pad surface to create an advantageous micro-texture. The advantageous micro-texture is statistically uniform and provides a polishing pad with improved break-in preconditioning time. Polishing pads of this invention find application to the polishing/planarization of substrates such as glass, dielectric/metal composites and substrates containing copper, silicon, silicon dioxide, platinum, and tungsten typically encountered in integrated circuit fabrication.
Molded Polishing Pad Having Integral Window
View pageUS Patent:
61711810, Jan 9, 2001
Filed:
Aug 17, 1999
Appl. No.:
9/375962
Inventors:
John V. H. Roberts - Newark DE
Barry Scott Pinheiro - Media PA
David B. James - Newark DE
Barry Scott Pinheiro - Media PA
David B. James - Newark DE
Assignee:
Rodel Holdings, Inc. - Wilmington DE
International Classification:
B24D 1100
US Classification:
451527
Abstract:
A polishing pad is formed as a one-piece article having a region which is transparent and an adjacent region which is opaque. The article is formed by solidifying a flowable polymeric material which at least initially has a uniform composition. The flowable polymeric material is processed during a molding operation to provide the transparent region and the adjacent opaque region. Types of polymeric material suitable for making the polishing pad include a single thermoplastic material, a blend of thermoplastic materials, and a reactive thermosetting polymer.