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Andris N Ezis

from Ellicott City, MD
Age ~68

Andris Ezis Phones & Addresses

  • 5331 Sunny Field Ct, Ellicott City, MD 21043 (410) 455-0727
  • Elkridge, MD
  • Miamisburg, OH
  • Union, KY
  • Beavercreek, OH
  • Fairborn, OH
  • 5331 Sunny Field Ct, Ellicott City, MD 21043 (410) 916-5040

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Publications

Us Patents

Integratable Differential Light Detector

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US Patent:
47543124, Jun 28, 1988
Filed:
Apr 7, 1987
Appl. No.:
7/035332
Inventors:
Dietrich W. Langer - Yellow Springs OH
Andris Ezis - Fairborn OH
Assignee:
The United States of America as represented by the Secretary of the Air
Force - Washington DC
International Classification:
H01L 2714
H01L 2912
H01L 2702
US Classification:
357 30
Abstract:
This invention is directed to a three-terminal semiconductor device which acts as a differential light detector. It is based on the operation of two reverse biased PIN photodetectors where one receives light through its P-doped surface and the other through its N-doped surface. The device is configured to be compatible with applications in integrated optics and with fiber optics. In principle of operation the invention relies on the production and collection of electrons from the detection of a first light intensity and the production and collection of holes from the detection of the intensity of a second light. This is done in a connected or integrated semiconductor which allows the recombination of electrons and holes. The excess number of electrons or holes, depending upon which light is received with the greatest intensity, is extracted from the recombination region and is the basis for the output signal.

Method To Integrate Dc & Rf Phase Change Switches Into High-Speed Sige Bicmos

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US Patent:
20230056901, Feb 23, 2023
Filed:
Nov 7, 2022
Appl. No.:
17/981744
Inventors:
- Falls Church VA, US
Robert M. Young - Ellicott City MD, US
Keith H. Chung - Columbia MD, US
Andris Ezis - Ellicott City MD, US
Ishan Wathuthanthri - Baltimore MD, US
International Classification:
H01L 27/24
H01L 45/00
H01L 21/8249
Abstract:
A method of integrating a phase change switch (PCS) into a Bipolar (Bi)/Complementary Metal Oxide Semiconductor (CMOS) (BiCMOS) process, comprises providing a base structure including BiCMOS circuitry on a semiconductor substrate, and forming on the base structure a dielectric contact window layer having metal through-plugs that contact the BiCMOS circuitry. The method includes constructing the PCS on the contact window layer. The PCS includes: a phase change region, between ohmic contacts on the phase change region, to operate as a switch controlled by heat. The method further includes forming, on the contact window layer and the PCS, a stack of alternating patterned metal layers and dielectric layers that interconnect the patterned metal layers, such that the stack connects a first of the ohmic contacts to the BiCMOS circuitry and provides connections to a second of the ohmic contacts and to the resistive heater.

Method To Integrate Dc & Rf Phase Change Switches Into High-Speed Sige Bicmos

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US Patent:
20210057487, Feb 25, 2021
Filed:
Aug 19, 2019
Appl. No.:
16/544212
Inventors:
- Falls Church VA, US
Robert M. Young - Ellicott City MD, US
Keith H. Chung - Columbia MD, US
Andris Ezis - Ellicott City MD, US
Ishan Wathuthanthri - Baltimore MD, US
International Classification:
H01L 27/24
H01L 45/00
H01L 21/8249
Abstract:
A method of integrating a phase change switch (PCS) into a Bipolar (Bi)/Complementary Metal Oxide Semiconductor (CMOS) (BiCMOS) process, comprises providing a base structure including BiCMOS circuitry on a semiconductor substrate, and forming on the base structure a dielectric contact window layer having metal through-plugs that contact the BiCMOS circuitry. The method includes constructing the PCS on the contact window layer. The PCS includes: a phase change region, between ohmic contacts on the phase change region, to operate as a switch controlled by heat. The method further includes forming, on the contact window layer and the PCS, a stack of alternating patterned metal layers and dielectric layers that interconnect the patterned metal layers, such that the stack connects a first of the ohmic contacts to the BiCMOS circuitry and provides connections to a second of the ohmic contacts and to the resistive heater.
Andris N Ezis from Ellicott City, MD, age ~68 Get Report